Effect of Implanted Cl and Deposited Oxides on the Pitting Behavior of Aluminum

Insight into the influence of Cl on the pitting behavior of aluminum has been gained using a combination of ion implantation and oxide deposition. High-purity Al thin-film samples were implanted with 35 keV Cl+ followed by plasma deposition of an aluminum oxide (Al2O3). The pitting potential of unim...

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Veröffentlicht in:	Journal of the Electrochemical Society 2005, Vol.152 (7), p.B244-B249
Hauptverfasser:	Serna, L. M., Johnson, C. M., Wall, F. D., Barbour, J. C.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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