Mesoscale Monte Carlo simulation of photoresist processing

Progress toward a comprehensive, chemically detailed, mesoscale photoresist simulation with predictive capability is reported. The semiconductor industry has developed a need for mechanistically detailed simulations capable of studying photoresist performance at nanometer dimensions. The nanometer-s...

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Veröffentlicht in:	Journal of the Electrochemical Society 2004-02, Vol.151 (2), p.G155-G161
Hauptverfasser:	SCHMID, Gerard M, STEWART, Michael D, BURNS, Sean D, WILLSON, C. Grant
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physics Solid surfaces and solid-solid interfaces Surface structure and topography Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
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