Deflection and maximum load of microfiltration membrane sieves made with silicon micromachining
With the use of silicon micromachining, an inorganic membrane sieve for microfiltration has been constructed having a silicon nitride membrane layer with thickness typically 1 /spl mu/m and perforations typically between 0.5 /spl mu/m and 10 /spl mu/m in diameter. As a support a -silicon wafer with...
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| Veröffentlicht in: | Journal of microelectromechanical systems 1997-03, Vol.6 (1), p.48-54 |
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| container_end_page | 54 |
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| container_title | Journal of microelectromechanical systems |
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| creator | van Rijn, C. van der Wekken, M. Nijdam, W. Elwenspoek, M. |
| description | With the use of silicon micromachining, an inorganic membrane sieve for microfiltration has been constructed having a silicon nitride membrane layer with thickness typically 1 /spl mu/m and perforations typically between 0.5 /spl mu/m and 10 /spl mu/m in diameter. As a support a -silicon wafer with openings of 1000 /spl mu/m in diameter has been used. The thin silicon nitride layer is deposited on an initially dense support by means of a suitable chemical vapor deposition method (LPCVD). Perforations in the membrane layer are obtained with use of standard photo lithography and reactive ion etching (RIE). The deflection and maximum load of the membrane sieves are calculated in a first approximation. Experiments to measure the maximum load of silicon-rich silicon nitride membranes have confirmed this approximation. |
| doi_str_mv | 10.1109/84.557530 |
| format | Article |
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As a support a -silicon wafer with openings of 1000 /spl mu/m in diameter has been used. The thin silicon nitride layer is deposited on an initially dense support by means of a suitable chemical vapor deposition method (LPCVD). Perforations in the membrane layer are obtained with use of standard photo lithography and reactive ion etching (RIE). The deflection and maximum load of the membrane sieves are calculated in a first approximation. 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As a support a -silicon wafer with openings of 1000 /spl mu/m in diameter has been used. The thin silicon nitride layer is deposited on an initially dense support by means of a suitable chemical vapor deposition method (LPCVD). Perforations in the membrane layer are obtained with use of standard photo lithography and reactive ion etching (RIE). The deflection and maximum load of the membrane sieves are calculated in a first approximation. Experiments to measure the maximum load of silicon-rich silicon nitride membranes have confirmed this approximation.</description><subject>Biomembranes</subject><subject>Chemical vapor deposition</subject><subject>Chemistry</subject><subject>Colloidal state and disperse state</subject><subject>Exact sciences and technology</subject><subject>Filters</subject><subject>Filtration</subject><subject>General and physical chemistry</subject><subject>Lacquers</subject><subject>Lithography</subject><subject>Membranes</subject><subject>Microfiltration</subject><subject>Micromachining</subject><subject>Silicon</subject><subject>Temperature</subject><issn>1057-7157</issn><issn>1941-0158</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1997</creationdate><recordtype>article</recordtype><recordid>eNqN0DtPwzAUBWALgUQpDKxMGRASQ4qfsT0i3lIlFpgtx7mmRnFS4pTHv8elVWcmW_Z3j-yD0CnBM0KwvlJ8JoQUDO-hCdGclJgItZ_3WMhSEiEP0VFK7xgTzlU1QeYWfAtuDH1X2K4pov0OcRWLtrdN0fsiBjf0PrTjYP9MhFgPtoMiBfiElH0DxVcYF_mgDW4t1hPRukXoQvd2jA68bROcbNcper2_e7l5LOfPD0831_PSMUnHklVMMaYxYSCwJURboT0wC9rXVDVCAmBXV7XCCteacdo4zRwWrKZcaq_ZFF1scpdD_7GCNJoYkoO2zW_tV8lQJZWUlP4D0lwgxxlebmD-TkoDeLMcQrTDjyHYrLs2iptN19meb0Ntcrb1uSEX0m6AVkSrimR2tmEBAHa324xfcdeGeQ</recordid><startdate>19970301</startdate><enddate>19970301</enddate><creator>van Rijn, C.</creator><creator>van der Wekken, M.</creator><creator>Nijdam, W.</creator><creator>Elwenspoek, M.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7TB</scope><scope>7U5</scope><scope>8FD</scope><scope>FR3</scope><scope>L7M</scope><scope>7QQ</scope><scope>JG9</scope></search><sort><creationdate>19970301</creationdate><title>Deflection and maximum load of microfiltration membrane sieves made with silicon micromachining</title><author>van Rijn, C. ; van der Wekken, M. ; Nijdam, W. ; Elwenspoek, M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c372t-3638339013e50a119a59fe3ae9fb28d57ee0cb6b8080b9342dc93c053b2479f93</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1997</creationdate><topic>Biomembranes</topic><topic>Chemical vapor deposition</topic><topic>Chemistry</topic><topic>Colloidal state and disperse state</topic><topic>Exact sciences and technology</topic><topic>Filters</topic><topic>Filtration</topic><topic>General and physical chemistry</topic><topic>Lacquers</topic><topic>Lithography</topic><topic>Membranes</topic><topic>Microfiltration</topic><topic>Micromachining</topic><topic>Silicon</topic><topic>Temperature</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>van Rijn, C.</creatorcontrib><creatorcontrib>van der Wekken, M.</creatorcontrib><creatorcontrib>Nijdam, W.</creatorcontrib><creatorcontrib>Elwenspoek, M.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Ceramic Abstracts</collection><collection>Materials Research Database</collection><jtitle>Journal of microelectromechanical systems</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>van Rijn, C.</au><au>van der Wekken, M.</au><au>Nijdam, W.</au><au>Elwenspoek, M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Deflection and maximum load of microfiltration membrane sieves made with silicon micromachining</atitle><jtitle>Journal of microelectromechanical systems</jtitle><stitle>JMEMS</stitle><date>1997-03-01</date><risdate>1997</risdate><volume>6</volume><issue>1</issue><spage>48</spage><epage>54</epage><pages>48-54</pages><issn>1057-7157</issn><eissn>1941-0158</eissn><coden>JMIYET</coden><abstract>With the use of silicon micromachining, an inorganic membrane sieve for microfiltration has been constructed having a silicon nitride membrane layer with thickness typically 1 /spl mu/m and perforations typically between 0.5 /spl mu/m and 10 /spl mu/m in diameter. As a support a -silicon wafer with openings of 1000 /spl mu/m in diameter has been used. The thin silicon nitride layer is deposited on an initially dense support by means of a suitable chemical vapor deposition method (LPCVD). Perforations in the membrane layer are obtained with use of standard photo lithography and reactive ion etching (RIE). The deflection and maximum load of the membrane sieves are calculated in a first approximation. Experiments to measure the maximum load of silicon-rich silicon nitride membranes have confirmed this approximation.</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/84.557530</doi><tpages>7</tpages><oa>free_for_read</oa></addata></record> |
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| ispartof | Journal of microelectromechanical systems, 1997-03, Vol.6 (1), p.48-54 |
| issn | 1057-7157 1941-0158 |
| language | eng |
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| source | IEEE Electronic Library (IEL) |
| subjects | Biomembranes Chemical vapor deposition Chemistry Colloidal state and disperse state Exact sciences and technology Filters Filtration General and physical chemistry Lacquers Lithography Membranes Microfiltration Micromachining Silicon Temperature |
| title | Deflection and maximum load of microfiltration membrane sieves made with silicon micromachining |
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