Fabrication of solar cell with stacked Ge islands for enhanced absorption in the infrared regime

We fabricated Si-based solar cell with stacked Ge islands grown via the Stranski–Krastanov growth mode in the intrinsic layer of pin diodes. The onset of the external quantum efficiency in the near infrared regime was extended up to approximately 1.4 μm for the solar cells with stacked Ge islands. T...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Thin solid films 2004-03, Vol.451 (Complete), p.604-607
Hauptverfasser: Usami, N., Alguno, A., Sawano, K., Ujihara, T., Fujiwara, K., Sazaki, G., Shiraki, Y., Nakajima, K.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 607
container_issue Complete
container_start_page 604
container_title Thin solid films
container_volume 451
creator Usami, N.
Alguno, A.
Sawano, K.
Ujihara, T.
Fujiwara, K.
Sazaki, G.
Shiraki, Y.
Nakajima, K.
description We fabricated Si-based solar cell with stacked Ge islands grown via the Stranski–Krastanov growth mode in the intrinsic layer of pin diodes. The onset of the external quantum efficiency in the near infrared regime was extended up to approximately 1.4 μm for the solar cells with stacked Ge islands. The quantum efficiency was found to increase with increasing number of stacking, showing that a part of electron–hole pairs generated within Ge islands was separated by the internal electric field and contributed to the photocurrent. Increase of the processing temperature for the impurity diffusion was found to bring blue-shift of the band gap through the intermixing of Si and Ge as well as the deformation of Ge islands. Therefore, low-temperature process was suggested to be necessary for further enhancement of quantum efficiency in the near infrared regime.
doi_str_mv 10.1016/j.tsf.2003.11.027
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_28143414</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0040609003015621</els_id><sourcerecordid>28143414</sourcerecordid><originalsourceid>FETCH-LOGICAL-c328t-8b1a16de0b4e1394fecc893544864484a8a4c1d1c4339cb59e46c0605c29ab5d3</originalsourceid><addsrcrecordid>eNp9kDFPwzAQhS0EEqXwA9g8sSXcxU6aiAlVUJAqscBsHOdCXdK42C6If49LmRmeTrp776T3MXaJkCNgdb3OY-jzAkDkiDkUsyM2wXrWZMVM4DGbAEjIKmjglJ2FsAYALAoxYa_3uvXW6GjdyF3Pgxu054aGgX_ZuOIhavNOHV8Qt2HQYxd47zyncaVHk_a6Dc5vf9N25HGVbGPvtU8nT292Q-fspNdDoIu_OWUv93fP84ds-bR4nN8uMyOKOmZ1ixqrjqCVhKKRPRlTN6KUsq6SpK61NNihkUI0pi0bkpWBCkpTNLotOzFlV4e_W-8-dhSi2tiw76FHcrugihqlkElThgej8S4ET73aervR_lshqD1LtVaJpdqzVIgqsUyZm0OGUoNPS14FY2kPwHoyUXXO_pP-AS6rfO4</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>28143414</pqid></control><display><type>article</type><title>Fabrication of solar cell with stacked Ge islands for enhanced absorption in the infrared regime</title><source>Elsevier ScienceDirect Journals Complete</source><creator>Usami, N. ; Alguno, A. ; Sawano, K. ; Ujihara, T. ; Fujiwara, K. ; Sazaki, G. ; Shiraki, Y. ; Nakajima, K.</creator><creatorcontrib>Usami, N. ; Alguno, A. ; Sawano, K. ; Ujihara, T. ; Fujiwara, K. ; Sazaki, G. ; Shiraki, Y. ; Nakajima, K.</creatorcontrib><description>We fabricated Si-based solar cell with stacked Ge islands grown via the Stranski–Krastanov growth mode in the intrinsic layer of pin diodes. The onset of the external quantum efficiency in the near infrared regime was extended up to approximately 1.4 μm for the solar cells with stacked Ge islands. The quantum efficiency was found to increase with increasing number of stacking, showing that a part of electron–hole pairs generated within Ge islands was separated by the internal electric field and contributed to the photocurrent. Increase of the processing temperature for the impurity diffusion was found to bring blue-shift of the band gap through the intermixing of Si and Ge as well as the deformation of Ge islands. Therefore, low-temperature process was suggested to be necessary for further enhancement of quantum efficiency in the near infrared regime.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/j.tsf.2003.11.027</identifier><language>eng</language><publisher>Elsevier B.V</publisher><subject>Ge islands ; Molecular beam epitaxy ; Solar cell ; Stranski–Krastanov growth mode</subject><ispartof>Thin solid films, 2004-03, Vol.451 (Complete), p.604-607</ispartof><rights>2003 Elsevier B.V.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c328t-8b1a16de0b4e1394fecc893544864484a8a4c1d1c4339cb59e46c0605c29ab5d3</citedby><cites>FETCH-LOGICAL-c328t-8b1a16de0b4e1394fecc893544864484a8a4c1d1c4339cb59e46c0605c29ab5d3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.tsf.2003.11.027$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>315,781,785,3551,27926,27927,45997</link.rule.ids></links><search><creatorcontrib>Usami, N.</creatorcontrib><creatorcontrib>Alguno, A.</creatorcontrib><creatorcontrib>Sawano, K.</creatorcontrib><creatorcontrib>Ujihara, T.</creatorcontrib><creatorcontrib>Fujiwara, K.</creatorcontrib><creatorcontrib>Sazaki, G.</creatorcontrib><creatorcontrib>Shiraki, Y.</creatorcontrib><creatorcontrib>Nakajima, K.</creatorcontrib><title>Fabrication of solar cell with stacked Ge islands for enhanced absorption in the infrared regime</title><title>Thin solid films</title><description>We fabricated Si-based solar cell with stacked Ge islands grown via the Stranski–Krastanov growth mode in the intrinsic layer of pin diodes. The onset of the external quantum efficiency in the near infrared regime was extended up to approximately 1.4 μm for the solar cells with stacked Ge islands. The quantum efficiency was found to increase with increasing number of stacking, showing that a part of electron–hole pairs generated within Ge islands was separated by the internal electric field and contributed to the photocurrent. Increase of the processing temperature for the impurity diffusion was found to bring blue-shift of the band gap through the intermixing of Si and Ge as well as the deformation of Ge islands. Therefore, low-temperature process was suggested to be necessary for further enhancement of quantum efficiency in the near infrared regime.</description><subject>Ge islands</subject><subject>Molecular beam epitaxy</subject><subject>Solar cell</subject><subject>Stranski–Krastanov growth mode</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2004</creationdate><recordtype>article</recordtype><recordid>eNp9kDFPwzAQhS0EEqXwA9g8sSXcxU6aiAlVUJAqscBsHOdCXdK42C6If49LmRmeTrp776T3MXaJkCNgdb3OY-jzAkDkiDkUsyM2wXrWZMVM4DGbAEjIKmjglJ2FsAYALAoxYa_3uvXW6GjdyF3Pgxu054aGgX_ZuOIhavNOHV8Qt2HQYxd47zyncaVHk_a6Dc5vf9N25HGVbGPvtU8nT292Q-fspNdDoIu_OWUv93fP84ds-bR4nN8uMyOKOmZ1ixqrjqCVhKKRPRlTN6KUsq6SpK61NNihkUI0pi0bkpWBCkpTNLotOzFlV4e_W-8-dhSi2tiw76FHcrugihqlkElThgej8S4ET73aervR_lshqD1LtVaJpdqzVIgqsUyZm0OGUoNPS14FY2kPwHoyUXXO_pP-AS6rfO4</recordid><startdate>20040322</startdate><enddate>20040322</enddate><creator>Usami, N.</creator><creator>Alguno, A.</creator><creator>Sawano, K.</creator><creator>Ujihara, T.</creator><creator>Fujiwara, K.</creator><creator>Sazaki, G.</creator><creator>Shiraki, Y.</creator><creator>Nakajima, K.</creator><general>Elsevier B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20040322</creationdate><title>Fabrication of solar cell with stacked Ge islands for enhanced absorption in the infrared regime</title><author>Usami, N. ; Alguno, A. ; Sawano, K. ; Ujihara, T. ; Fujiwara, K. ; Sazaki, G. ; Shiraki, Y. ; Nakajima, K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c328t-8b1a16de0b4e1394fecc893544864484a8a4c1d1c4339cb59e46c0605c29ab5d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2004</creationdate><topic>Ge islands</topic><topic>Molecular beam epitaxy</topic><topic>Solar cell</topic><topic>Stranski–Krastanov growth mode</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Usami, N.</creatorcontrib><creatorcontrib>Alguno, A.</creatorcontrib><creatorcontrib>Sawano, K.</creatorcontrib><creatorcontrib>Ujihara, T.</creatorcontrib><creatorcontrib>Fujiwara, K.</creatorcontrib><creatorcontrib>Sazaki, G.</creatorcontrib><creatorcontrib>Shiraki, Y.</creatorcontrib><creatorcontrib>Nakajima, K.</creatorcontrib><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Usami, N.</au><au>Alguno, A.</au><au>Sawano, K.</au><au>Ujihara, T.</au><au>Fujiwara, K.</au><au>Sazaki, G.</au><au>Shiraki, Y.</au><au>Nakajima, K.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Fabrication of solar cell with stacked Ge islands for enhanced absorption in the infrared regime</atitle><jtitle>Thin solid films</jtitle><date>2004-03-22</date><risdate>2004</risdate><volume>451</volume><issue>Complete</issue><spage>604</spage><epage>607</epage><pages>604-607</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><abstract>We fabricated Si-based solar cell with stacked Ge islands grown via the Stranski–Krastanov growth mode in the intrinsic layer of pin diodes. The onset of the external quantum efficiency in the near infrared regime was extended up to approximately 1.4 μm for the solar cells with stacked Ge islands. The quantum efficiency was found to increase with increasing number of stacking, showing that a part of electron–hole pairs generated within Ge islands was separated by the internal electric field and contributed to the photocurrent. Increase of the processing temperature for the impurity diffusion was found to bring blue-shift of the band gap through the intermixing of Si and Ge as well as the deformation of Ge islands. Therefore, low-temperature process was suggested to be necessary for further enhancement of quantum efficiency in the near infrared regime.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.tsf.2003.11.027</doi><tpages>4</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0040-6090
ispartof Thin solid films, 2004-03, Vol.451 (Complete), p.604-607
issn 0040-6090
1879-2731
language eng
recordid cdi_proquest_miscellaneous_28143414
source Elsevier ScienceDirect Journals Complete
subjects Ge islands
Molecular beam epitaxy
Solar cell
Stranski–Krastanov growth mode
title Fabrication of solar cell with stacked Ge islands for enhanced absorption in the infrared regime
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-17T22%3A09%3A54IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Fabrication%20of%20solar%20cell%20with%20stacked%20Ge%20islands%20for%20enhanced%20absorption%20in%20the%20infrared%20regime&rft.jtitle=Thin%20solid%20films&rft.au=Usami,%20N.&rft.date=2004-03-22&rft.volume=451&rft.issue=Complete&rft.spage=604&rft.epage=607&rft.pages=604-607&rft.issn=0040-6090&rft.eissn=1879-2731&rft_id=info:doi/10.1016/j.tsf.2003.11.027&rft_dat=%3Cproquest_cross%3E28143414%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=28143414&rft_id=info:pmid/&rft_els_id=S0040609003015621&rfr_iscdi=true