Adhesion trends and growth mode of ultra-thin copper films on MgO

Ab initio simulations are performed for Cu atoms adsorbed on the perfect MgO(001) substrate, with an ordered metal coverage varied from 1/4 monolayer (ML), i.e. almost single atoms, up to 1 ML. A strong dependence of the adhesion energy and the sub-monolayer film distance from the substrate on the s...

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Veröffentlicht in:Journal of physics. Condensed matter 2004-07, Vol.16 (28), p.4881-4896
Hauptverfasser: Zhukovskii, Yuri F, Kotomin, Eugene A, Fuks, David, Dorfman, Simon, Stoneham, A Marshall, Borstel, Gunnar
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Sprache:eng
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