Correlation between process parameters, microstructure and hardness of titanium nitride films by chemical vapor deposition
Titanium nitride (TiN) films were grown on graphite and cemented carbide substrates by conventional chemical vapor deposition. The growth characteristics, microstructure and hardness of TiN films were evaluated. It was found that the preferred orientations and morphology of the TiN films are related...
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| Veröffentlicht in: | Surface & coatings technology 2004-02, Vol.179 (1), p.103-109 |
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| creator | Cheng, Hsyi-En Wen, Yao-Wei |
| description | Titanium nitride (TiN) films were grown on graphite and cemented carbide substrates by conventional chemical vapor deposition. The growth characteristics, microstructure and hardness of TiN films were evaluated. It was found that the preferred orientations and morphology of the TiN films are related to the deposition temperature and gas concentration. Lower deposition temperature favors the formation of twinned crystals and results in (2
1
1) textured film whereas higher deposition temperature favors twin-free crystals and results in (1
0
0) textured film. The hardness of TiN films depends on the film morphology and microstructure. The films with lower porosity, smaller grain size, and composed of a mixture of different types of crystals possess higher hardness. The hardness is over 2000 Hv
0.1 for films with a mixture of very fine lenticular-like crystals and pyramid crystals. |
| doi_str_mv | 10.1016/S0257-8972(03)00789-8 |
| format | Article |
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1
1) textured film whereas higher deposition temperature favors twin-free crystals and results in (1
0
0) textured film. The hardness of TiN films depends on the film morphology and microstructure. The films with lower porosity, smaller grain size, and composed of a mixture of different types of crystals possess higher hardness. The hardness is over 2000 Hv
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1
1) textured film whereas higher deposition temperature favors twin-free crystals and results in (1
0
0) textured film. The hardness of TiN films depends on the film morphology and microstructure. The films with lower porosity, smaller grain size, and composed of a mixture of different types of crystals possess higher hardness. The hardness is over 2000 Hv
0.1 for films with a mixture of very fine lenticular-like crystals and pyramid crystals.</description><subject>Chemical vapor deposition</subject><subject>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Hardness</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Microstructure</subject><subject>Morphology</subject><subject>Physics</subject><subject>Titanium nitride</subject><issn>0257-8972</issn><issn>1879-3347</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2004</creationdate><recordtype>article</recordtype><recordid>eNqFkE1rFTEUhoMoeK3-BCGbFgXHnkySSWYl5eIXFFyo65CbOaEpM8k0yVTaX9-Z3qJLV2fzvOflfQh5y-AjA9ad_4RWqkb3qn0H_D2A0n2jn5Ed06pvOBfqOdn9RV6SV6VcAwBTvdiR-33KGUdbQ4r0gPUPYqRzTg5LobPNdsKKuXygU3A5lZoXV5eM1MaBXtk8xI1LntZQbQzLRGOoOQxIfRinQg931F3hmrUjvbVzynTAOZWw1b0mL7wdC755uifk95fPv_bfmssfX7_vLy4bJ7iojfaCu5YPHA8asVUcOonWo-g59wqUkyC8OHgnO8F66TohoePYAWjLnR74CTk7_l1n3SxYqplCcTiONmJaimk1A913YgXlEdyWlozezDlMNt8ZBmYzbR5Nm02jAW4eTRu95k6fCmxZh_psowvlX1hK3jPJV-7TkcN17W3AbIoLGB0OIaOrZkjhP00Pii6VlQ</recordid><startdate>20040202</startdate><enddate>20040202</enddate><creator>Cheng, Hsyi-En</creator><creator>Wen, Yao-Wei</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20040202</creationdate><title>Correlation between process parameters, microstructure and hardness of titanium nitride films by chemical vapor deposition</title><author>Cheng, Hsyi-En ; Wen, Yao-Wei</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c434t-8f43c23d3eb8ee273065eafe4933f707c504f4bfc564195c645063e6008a3c8d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2004</creationdate><topic>Chemical vapor deposition</topic><topic>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>Hardness</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Microstructure</topic><topic>Morphology</topic><topic>Physics</topic><topic>Titanium nitride</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Cheng, Hsyi-En</creatorcontrib><creatorcontrib>Wen, Yao-Wei</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Surface & coatings technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Cheng, Hsyi-En</au><au>Wen, Yao-Wei</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Correlation between process parameters, microstructure and hardness of titanium nitride films by chemical vapor deposition</atitle><jtitle>Surface & coatings technology</jtitle><date>2004-02-02</date><risdate>2004</risdate><volume>179</volume><issue>1</issue><spage>103</spage><epage>109</epage><pages>103-109</pages><issn>0257-8972</issn><eissn>1879-3347</eissn><coden>SCTEEJ</coden><abstract>Titanium nitride (TiN) films were grown on graphite and cemented carbide substrates by conventional chemical vapor deposition. The growth characteristics, microstructure and hardness of TiN films were evaluated. It was found that the preferred orientations and morphology of the TiN films are related to the deposition temperature and gas concentration. Lower deposition temperature favors the formation of twinned crystals and results in (2
1
1) textured film whereas higher deposition temperature favors twin-free crystals and results in (1
0
0) textured film. The hardness of TiN films depends on the film morphology and microstructure. The films with lower porosity, smaller grain size, and composed of a mixture of different types of crystals possess higher hardness. The hardness is over 2000 Hv
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| source | Elsevier ScienceDirect Journals |
| subjects | Chemical vapor deposition Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Hardness Materials science Methods of deposition of films and coatings film growth and epitaxy Microstructure Morphology Physics Titanium nitride |
| title | Correlation between process parameters, microstructure and hardness of titanium nitride films by chemical vapor deposition |
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