Chemical bath deposition of tin selenide thin films

Tin selenide thin films have been deposited on indium tin oxide glass slides in alkaline medium. The method is based on simple bath deposition technique that requires less chemicals and monitoring. Uniform and well-adhered films were obtained upon required deposition period. X-ray, morphology, optic...

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Veröffentlicht in:Materials science & engineering. B, Solid-state materials for advanced technology Solid-state materials for advanced technology, 2004-03, Vol.107 (2), p.181-185
Hauptverfasser: Zainal, Z, Saravanan, N, Anuar, K, Hussein, M.Z, Yunus, W.M.M
Format: Artikel
Sprache:eng
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Zusammenfassung:Tin selenide thin films have been deposited on indium tin oxide glass slides in alkaline medium. The method is based on simple bath deposition technique that requires less chemicals and monitoring. Uniform and well-adhered films were obtained upon required deposition period. X-ray, morphology, optical and photoelectrochemical study was carried out for the as-deposited film. The films were polycrystalline and covered the surface of the substrate completely. Photoelectrochemical test shows a p-type conduction mechanism. The band gap was found to be about 1.25 eV with direct transition.
ISSN:0921-5107
1873-4944
DOI:10.1016/j.mseb.2003.11.008