The fabrication of stable platinum–silicon oxide multilayers for X-ray mirrors
An investigation has been carried out to determine the conditions required for the fabrication of stable SiO 2–Pt multilayers using DC-magnetron sputtering for the Pt and RF-magnetron sputtering for the SiO 2. As a preliminary investigation, single layers of Pt on SiO 2 were analysed by X-ray reflec...
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| Veröffentlicht in: | Thin solid films 2003, Vol.423 (1), p.1-12 |
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| creator | Solina, D.M Cheary, R.W Swift, P.D McCredie, G |
| description | An investigation has been carried out to determine the conditions required for the fabrication of stable SiO
2–Pt multilayers using DC-magnetron sputtering for the Pt and RF-magnetron sputtering for the SiO
2. As a preliminary investigation, single layers of Pt on SiO
2 were analysed by X-ray reflectivity (XRR) and X-ray photoelectron spectroscopy (XPS) to develop a model of the Pt–SiO
2 interface layer. The results indicated that a distinct interface layer develops as a Pt silicate approximately 6 Å thick. SiO
2–Pt multilayers fabricated with a period
d>65 Å using pure argon as the sputtering gas, display X-ray reflectivity patterns which can be accurately characterised by a repeating bilayer model. When
d |
| doi_str_mv | 10.1016/S0040-6090(02)00360-7 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_28019254</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0040609002003607</els_id><sourcerecordid>28019254</sourcerecordid><originalsourceid>FETCH-LOGICAL-c399t-c3ce6c868719e84104ff87d1f78b15b03fb11763d11d30dbe8583c2b2b59dd713</originalsourceid><addsrcrecordid>eNqFkM9KJDEQh8Oi4Kj7CEJfXNxDr1VJdyd9EpH9B4KCCnsL6aTCRtLds0mP7Nx8B99wn2R7HNGjlyqo-qp-8DF2hPAFAZvTG4AKygZaOAH-GUA0UMoPbIFKtiWXAnfY4hXZY_s53wMAci4W7Pr2NxXedClYM4VxKEZf5Ml0kYplnCfDqv_3-JRDDHaz_BscFf0qTiGaNaVc-DEVv8pk1kUfUhpTPmS73sRMH1_6Abv79vX24kd5efX958X5ZWlF205ztdRY1SiJLakKofJeSYdeqg7rDoTvEGUjHKIT4DpStRKWd7yrW-ckigP2aft3mcY_K8qT7kO2FKMZaFxlzRVgy-vqfVCquuaKz2C9BW0ac07k9TKF3qS1RtAb0fpZtN5Y1MD1s2gt57vjlwCTrYk-mcGG_HZcVaJq5Ob_2ZajWctDoKSzDTRYciGRnbQbwztJ_wHfqpLU</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>27855282</pqid></control><display><type>article</type><title>The fabrication of stable platinum–silicon oxide multilayers for X-ray mirrors</title><source>ScienceDirect</source><creator>Solina, D.M ; Cheary, R.W ; Swift, P.D ; McCredie, G</creator><creatorcontrib>Solina, D.M ; Cheary, R.W ; Swift, P.D ; McCredie, G</creatorcontrib><description>An investigation has been carried out to determine the conditions required for the fabrication of stable SiO
2–Pt multilayers using DC-magnetron sputtering for the Pt and RF-magnetron sputtering for the SiO
2. As a preliminary investigation, single layers of Pt on SiO
2 were analysed by X-ray reflectivity (XRR) and X-ray photoelectron spectroscopy (XPS) to develop a model of the Pt–SiO
2 interface layer. The results indicated that a distinct interface layer develops as a Pt silicate approximately 6 Å thick. SiO
2–Pt multilayers fabricated with a period
d>65 Å using pure argon as the sputtering gas, display X-ray reflectivity patterns which can be accurately characterised by a repeating bilayer model. When
d<65 Å the multilayer becomes unstable upon exposure to air. Additional peaks develop in the XRR pattern which increase in magnitude with time. These peaks arise from the expansion of the SiO
2 layers in the multilayer starting from the top bilayer and gradually working through the multilayer. In the as-prepared specimens the SiO
2 layers are incompletely oxidised and have a composition SiO
x
(
x<2) and, on exposure to air, oxygen diffuses through the multilayer surface converting the SiO
x
to SiO
2. By introducing a small partial pressure of oxygen into the sputtering gas during deposition, multilayers with
d<65 Å remained stable on exposure to air. Under these conditions the density of the platinum layers determined from XRR measurements was reduced by approximately 25%. XPS showed that the platinum layer contained bonded oxygen in the form of platinum oxide PtO
x
(
x<1). SiO
2/PtO
x
multilayers have been fabricated with periods down to 13 Å, but the intensity of the first order peak drops off dramatically once the thickness of the PtO
x layer is less that 10–12 Å.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/S0040-6090(02)00360-7</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Applied sciences ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Deposition by sputtering ; Exact sciences and technology ; Fundamental areas of phenomenology (including applications) ; Lenses, prisms and mirrors ; Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties ; Materials science ; Metals. Metallurgy ; Methods of deposition of films and coatings; film growth and epitaxy ; Multilayers ; Optical elements, devices, and systems ; Optics ; Physics ; Platinum ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; X-Ray photoelectron spectroscopy ; X-Ray total reflection analysis</subject><ispartof>Thin solid films, 2003, Vol.423 (1), p.1-12</ispartof><rights>2003 Elsevier Science B.V.</rights><rights>2003 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c399t-c3ce6c868719e84104ff87d1f78b15b03fb11763d11d30dbe8583c2b2b59dd713</citedby><cites>FETCH-LOGICAL-c399t-c3ce6c868719e84104ff87d1f78b15b03fb11763d11d30dbe8583c2b2b59dd713</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/S0040-6090(02)00360-7$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3550,4024,27923,27924,27925,45995</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=14434672$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Solina, D.M</creatorcontrib><creatorcontrib>Cheary, R.W</creatorcontrib><creatorcontrib>Swift, P.D</creatorcontrib><creatorcontrib>McCredie, G</creatorcontrib><title>The fabrication of stable platinum–silicon oxide multilayers for X-ray mirrors</title><title>Thin solid films</title><description>An investigation has been carried out to determine the conditions required for the fabrication of stable SiO
2–Pt multilayers using DC-magnetron sputtering for the Pt and RF-magnetron sputtering for the SiO
2. As a preliminary investigation, single layers of Pt on SiO
2 were analysed by X-ray reflectivity (XRR) and X-ray photoelectron spectroscopy (XPS) to develop a model of the Pt–SiO
2 interface layer. The results indicated that a distinct interface layer develops as a Pt silicate approximately 6 Å thick. SiO
2–Pt multilayers fabricated with a period
d>65 Å using pure argon as the sputtering gas, display X-ray reflectivity patterns which can be accurately characterised by a repeating bilayer model. When
d<65 Å the multilayer becomes unstable upon exposure to air. Additional peaks develop in the XRR pattern which increase in magnitude with time. These peaks arise from the expansion of the SiO
2 layers in the multilayer starting from the top bilayer and gradually working through the multilayer. In the as-prepared specimens the SiO
2 layers are incompletely oxidised and have a composition SiO
x
(
x<2) and, on exposure to air, oxygen diffuses through the multilayer surface converting the SiO
x
to SiO
2. By introducing a small partial pressure of oxygen into the sputtering gas during deposition, multilayers with
d<65 Å remained stable on exposure to air. Under these conditions the density of the platinum layers determined from XRR measurements was reduced by approximately 25%. XPS showed that the platinum layer contained bonded oxygen in the form of platinum oxide PtO
x
(
x<1). SiO
2/PtO
x
multilayers have been fabricated with periods down to 13 Å, but the intensity of the first order peak drops off dramatically once the thickness of the PtO
x layer is less that 10–12 Å.</description><subject>Applied sciences</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Deposition by sputtering</subject><subject>Exact sciences and technology</subject><subject>Fundamental areas of phenomenology (including applications)</subject><subject>Lenses, prisms and mirrors</subject><subject>Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties</subject><subject>Materials science</subject><subject>Metals. Metallurgy</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Multilayers</subject><subject>Optical elements, devices, and systems</subject><subject>Optics</subject><subject>Physics</subject><subject>Platinum</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>X-Ray photoelectron spectroscopy</subject><subject>X-Ray total reflection analysis</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2003</creationdate><recordtype>article</recordtype><recordid>eNqFkM9KJDEQh8Oi4Kj7CEJfXNxDr1VJdyd9EpH9B4KCCnsL6aTCRtLds0mP7Nx8B99wn2R7HNGjlyqo-qp-8DF2hPAFAZvTG4AKygZaOAH-GUA0UMoPbIFKtiWXAnfY4hXZY_s53wMAci4W7Pr2NxXedClYM4VxKEZf5Ml0kYplnCfDqv_3-JRDDHaz_BscFf0qTiGaNaVc-DEVv8pk1kUfUhpTPmS73sRMH1_6Abv79vX24kd5efX958X5ZWlF205ztdRY1SiJLakKofJeSYdeqg7rDoTvEGUjHKIT4DpStRKWd7yrW-ckigP2aft3mcY_K8qT7kO2FKMZaFxlzRVgy-vqfVCquuaKz2C9BW0ac07k9TKF3qS1RtAb0fpZtN5Y1MD1s2gt57vjlwCTrYk-mcGG_HZcVaJq5Ob_2ZajWctDoKSzDTRYciGRnbQbwztJ_wHfqpLU</recordid><startdate>2003</startdate><enddate>2003</enddate><creator>Solina, D.M</creator><creator>Cheary, R.W</creator><creator>Swift, P.D</creator><creator>McCredie, G</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>8FD</scope><scope>JG9</scope><scope>7SR</scope><scope>8BQ</scope></search><sort><creationdate>2003</creationdate><title>The fabrication of stable platinum–silicon oxide multilayers for X-ray mirrors</title><author>Solina, D.M ; Cheary, R.W ; Swift, P.D ; McCredie, G</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c399t-c3ce6c868719e84104ff87d1f78b15b03fb11763d11d30dbe8583c2b2b59dd713</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2003</creationdate><topic>Applied sciences</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Deposition by sputtering</topic><topic>Exact sciences and technology</topic><topic>Fundamental areas of phenomenology (including applications)</topic><topic>Lenses, prisms and mirrors</topic><topic>Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties</topic><topic>Materials science</topic><topic>Metals. Metallurgy</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Multilayers</topic><topic>Optical elements, devices, and systems</topic><topic>Optics</topic><topic>Physics</topic><topic>Platinum</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>X-Ray photoelectron spectroscopy</topic><topic>X-Ray total reflection analysis</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Solina, D.M</creatorcontrib><creatorcontrib>Cheary, R.W</creatorcontrib><creatorcontrib>Swift, P.D</creatorcontrib><creatorcontrib>McCredie, G</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Solina, D.M</au><au>Cheary, R.W</au><au>Swift, P.D</au><au>McCredie, G</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The fabrication of stable platinum–silicon oxide multilayers for X-ray mirrors</atitle><jtitle>Thin solid films</jtitle><date>2003</date><risdate>2003</risdate><volume>423</volume><issue>1</issue><spage>1</spage><epage>12</epage><pages>1-12</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>An investigation has been carried out to determine the conditions required for the fabrication of stable SiO
2–Pt multilayers using DC-magnetron sputtering for the Pt and RF-magnetron sputtering for the SiO
2. As a preliminary investigation, single layers of Pt on SiO
2 were analysed by X-ray reflectivity (XRR) and X-ray photoelectron spectroscopy (XPS) to develop a model of the Pt–SiO
2 interface layer. The results indicated that a distinct interface layer develops as a Pt silicate approximately 6 Å thick. SiO
2–Pt multilayers fabricated with a period
d>65 Å using pure argon as the sputtering gas, display X-ray reflectivity patterns which can be accurately characterised by a repeating bilayer model. When
d<65 Å the multilayer becomes unstable upon exposure to air. Additional peaks develop in the XRR pattern which increase in magnitude with time. These peaks arise from the expansion of the SiO
2 layers in the multilayer starting from the top bilayer and gradually working through the multilayer. In the as-prepared specimens the SiO
2 layers are incompletely oxidised and have a composition SiO
x
(
x<2) and, on exposure to air, oxygen diffuses through the multilayer surface converting the SiO
x
to SiO
2. By introducing a small partial pressure of oxygen into the sputtering gas during deposition, multilayers with
d<65 Å remained stable on exposure to air. Under these conditions the density of the platinum layers determined from XRR measurements was reduced by approximately 25%. XPS showed that the platinum layer contained bonded oxygen in the form of platinum oxide PtO
x
(
x<1). SiO
2/PtO
x
multilayers have been fabricated with periods down to 13 Å, but the intensity of the first order peak drops off dramatically once the thickness of the PtO
x layer is less that 10–12 Å.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/S0040-6090(02)00360-7</doi><tpages>12</tpages></addata></record> |
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| subjects | Applied sciences Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Exact sciences and technology Fundamental areas of phenomenology (including applications) Lenses, prisms and mirrors Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties Materials science Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Multilayers Optical elements, devices, and systems Optics Physics Platinum Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) X-Ray photoelectron spectroscopy X-Ray total reflection analysis |
| title | The fabrication of stable platinum–silicon oxide multilayers for X-ray mirrors |
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