DC magnetron reactive sputtered InN thin film electrodes as photoanodes in aqueous solution. A study of as prepared and nitrogen annealed electrodes

Thin films of indium nitride, InN, were produced by reactive magnetron DC sputtering. By post treatment in dinitrogen, N 2, in the temperature range 350–500 °C a set of films gradually going from InN to indium oxide, In 2O 3 was obtained (due to dioxygen impurities in the annealing gas). Those films...

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Veröffentlicht in:	Thin solid films 2006-07, Vol.510 (1), p.6-14
Hauptverfasser:	Lindgren, Torbjörn, Torres, Gemma Romualdo, Ederth, Jesper, Karmhag, Richard, Granqvist, Claes-Göran, Lindquist, Sten-Eric
Format:	Artikel
Sprache:	eng
Schlagworte:	Aqueous solution Cold working, work hardening annealing, quenching, tempering, recovery, and recrystallization textures Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Exact sciences and technology Indium nitride Indium oxide Materials science Methods of deposition of films and coatings film growth and epitaxy Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Photoelectrochemistry Physics Sputtering Structural properties Thin film Treatment of materials and its effects on microstructure and properties
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