Sputtering of stepped Cu surfaces by 3 keV Ar projectiles with glancing angles of incidence

The sputtering characteristics of Cu crystal targets with stepped surfaces have been examined with classical dynamics computer simulations. The predicted yields, angular distributions, statistical properties and spatial origins of sputtered atoms are reported. The three targets investigated were: a...

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Veröffentlicht in:	Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms Beam interactions with materials and atoms, 2003-10, Vol.211 (2), p.190-198
1. Verfasser:	Karolewski, M.A.
Format:	Artikel
Sprache:	eng
Schlagworte:	Simulation Sputtering Stepped surfaces
Online-Zugang:	Volltext
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