Sputter deposited nanocrystalline Ni-25Al alloy thin films and Ni/Ni3Al multilayers

Thin films of nominal composition Ni-25at%Al have been sputter deposited from a target of the intermetallic compound Ni3Al at different substrate deposition temperatures. The film deposited on an unheated substrate exhibited a strongly textured columnar growth morphology and consisted of a mixture o...

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Veröffentlicht in:	Thin solid films 2003-01, Vol.424 (1), p.93-98
Hauptverfasser:	BANERJEE, R, THOMPSON, G. B, ANDERSON, P. M, FRASER, H. L
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Exact sciences and technology Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties Materials science Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
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