Thermodynamics of hydrogen uptake in Mg films studied by resistance measurements

Resistance measurements were done on 100 nm thin magnesium films covered with 10 nm palladium in temperatures ranging from 60 to 100 ° C. The samples were grown by dc sputtering system with a base pressure of ∼ 1 0 − 6 mbar. The measurements were done in situ in the sputtering chamber where the samples where grown, without breaking the vacuum so as to minimize contamination. Results show similar thermodynamic behavior to that found in bulk samples and samples made by ball milling. Resistance measurements of thin films could therefore be a useful tool in screening for changes in the binding energy of hydrogen in alloyed thin Mg films. Owing to the significantly lower loading times of thin films at this temperature range, a wide range of new materials consisting of nanoscale structures of Mg and other elements can be produced through sputtering and studied with the equipment.