Using As/P exchange processes to modify InAs/InP quantum dots

We have used low temperature photoluminescence and atomic force microscopy to study the growth, by chemical beam epitaxy, of self-assembled InAs/InP quantum dots. By modifying the procedure for capping the dots we have been able to control their emission energy by adjusting their height. This proces...

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Veröffentlicht in:Journal of crystal growth 2003-09, Vol.257 (1-2), p.89-96
Hauptverfasser: Poole, P.J., Williams, R.L., Lefebvre, J., Moisa, S.
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Sprache:eng
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Zusammenfassung:We have used low temperature photoluminescence and atomic force microscopy to study the growth, by chemical beam epitaxy, of self-assembled InAs/InP quantum dots. By modifying the procedure for capping the dots we have been able to control their emission energy by adjusting their height. This process relies on the As/P exchange process that occurs when an InAs surface is exposed to a phosphorus flux. This exchange is shown to occur for both continuous and discontinuous capping procedures.
ISSN:0022-0248
1873-5002
DOI:10.1016/S0022-0248(03)01421-0