Stoichiometry, morphology and structure of CdS layers grown on InP(1 0 0) from atomic sulfur beam generated from H2S gas and thermally evaporated Cd using molecular beam epitaxy

Epitaxial growth of cadmium sulfide on InP(100) was carried out using molecular beam epitaxy (MBE). Cd was deposited from an effusion cell while sulfur was supplied from ionized H2S gas using an RF atomic source. Epitaxial growth was achieved at growth temperatures ranging from 150DGC to 300DGC and...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of crystal growth 2003-07, Vol.255 (1-2), p.1-7
Hauptverfasser: JOO WON CHOI, BHUPATHIRAJU, A, HASAN, M.-A, LANNON, John M
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!