Optical investigation of silicon nitride thin films deposited by r.f. magnetron sputtering

We prepared SiN x thin films by r.f. magnetron sputtering without intentional substrate heating with refractive index approximately 2.0. Several different deposition routines showed that sputtering pressure played the most dominant role in film oxygen incorporation, film packing density and resistan...

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Veröffentlicht in:	Thin solid films 2003-02, Vol.425 (1), p.196-202
Hauptverfasser:	Xu, Gang, Jin, Ping, Tazawa, Masato, Yoshimura, Kazuki
Format:	Artikel
Sprache:	eng
Schlagworte:	Amorphous materials Amorphous semiconductors glasses Amorphous semiconductors glasses nanocrystalline materials Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Optical properties Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of specific thin films Physics Silicon nitride Sputtering
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