Electrical and optical characterization of n-type ZnO thin films

N‐type ZnO thin films were successfully grown by sol‐gel dipping coat method on glass substrates at 300–600 °C under air atmosphere. Poly ZnO thin films were obtained at more than 300 °C. Values of full width at half maximum of (0002) peak at the XRD spectra became small with the increasing the subs...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Physica status solidi. C 2003-02 (2), p.626-630
Hauptverfasser: Yoshino, K., Hata, T., Kakeno, T., Komaki, H., Yoneta, M., Akaki, Y., Ikari, T.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!