Nanometric-layered CrN/TiN thin films: mechanical strength and thermal stability
Nanometric-layered CrN/TiN coatings were deposited using unbalanced magnetron sputtering. The layered coating structure was characterised by X-ray diffractometry, and the mechanical properties were measured by nano-indentation and scratch test. High temperature annealing at 400–750 °C was carried ou...
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| Veröffentlicht in: | Thin solid films 2003-01, Vol.424 (1), p.99-102 |
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| creator | Zeng, X.T. Zhang, S. Sun, C.Q. Liu, Y.C. |
| description | Nanometric-layered CrN/TiN coatings were deposited using unbalanced magnetron sputtering. The layered coating structure was characterised by X-ray diffractometry, and the mechanical properties were measured by nano-indentation and scratch test. High temperature annealing at 400–750 °C was carried out to investigate the thermal stability of the coating structure and mechanical properties. For comparison, samples of TiN and CrN deposited under similar conditions were also annealed and tested. The results showed that nano-layered CrN/TiN has excellent mechanical and thermal properties. Nano-hardness of 40 GPa and scratch adhesion of 80 N were achieved at a wavelength of 7.5 nm and a substrate bias of −80 V. The coating demonstrates application prospects in the stamping/cutting tools industry. |
| doi_str_mv | 10.1016/S0040-6090(02)00921-5 |
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The layered coating structure was characterised by X-ray diffractometry, and the mechanical properties were measured by nano-indentation and scratch test. High temperature annealing at 400–750 °C was carried out to investigate the thermal stability of the coating structure and mechanical properties. For comparison, samples of TiN and CrN deposited under similar conditions were also annealed and tested. The results showed that nano-layered CrN/TiN has excellent mechanical and thermal properties. Nano-hardness of 40 GPa and scratch adhesion of 80 N were achieved at a wavelength of 7.5 nm and a substrate bias of −80 V. 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The layered coating structure was characterised by X-ray diffractometry, and the mechanical properties were measured by nano-indentation and scratch test. High temperature annealing at 400–750 °C was carried out to investigate the thermal stability of the coating structure and mechanical properties. For comparison, samples of TiN and CrN deposited under similar conditions were also annealed and tested. The results showed that nano-layered CrN/TiN has excellent mechanical and thermal properties. Nano-hardness of 40 GPa and scratch adhesion of 80 N were achieved at a wavelength of 7.5 nm and a substrate bias of −80 V. The coating demonstrates application prospects in the stamping/cutting tools industry.</description><subject>Coatings</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Exact sciences and technology</subject><subject>Hardness and oxidation</subject><subject>Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties</subject><subject>Nanostructures</subject><subject>Physical vapour deposition</subject><subject>Physics</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2003</creationdate><recordtype>article</recordtype><recordid>eNqNkMtKAzEUhoMoWKuPIMxG0cXYk8xkMnEjUrxBqYJ1HTK52MhcajIV-vamF3Spq3M4fP_54UPoFMMVBlyMXgFySAvgcAHkEoATnNI9NMAl4ylhGd5Hgx_kEB2F8AEAmJBsgF6msu0a03un0lqujDc6GfvpaOamST93bWJd3YTrpDFqLlunZJ2E3pv2vZ8nstWRMb7ZHGXlatevjtGBlXUwJ7s5RG_3d7PxYzp5fnga305SRTHrU0oKayFnFdOaywLTosy15CXXmCkAScEWCnTFFLc8A8JkVuoKdFywIrLKhuh8-3fhu8-lCb1oXFCmrmVrumUQhHEgmBf_AiMHEaRbUPkuBG-sWHjXSL8SGMRatNiIFmuLAojYiBY05s52BTJEP9bLVrnwG84pzmiZRe5my5mo5csZL4JyplVGO29UL3Tn_mj6BsX9kZY</recordid><startdate>20030101</startdate><enddate>20030101</enddate><creator>Zeng, X.T.</creator><creator>Zhang, S.</creator><creator>Sun, C.Q.</creator><creator>Liu, Y.C.</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>8FD</scope><scope>JG9</scope><scope>8BQ</scope></search><sort><creationdate>20030101</creationdate><title>Nanometric-layered CrN/TiN thin films: mechanical strength and thermal stability</title><author>Zeng, X.T. ; Zhang, S. ; Sun, C.Q. ; Liu, Y.C.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c517t-526ff047b7dd9a615684da989d17c00a50f6c0db7c9f93027a38db0d27a1c2ab3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2003</creationdate><topic>Coatings</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Exact sciences and technology</topic><topic>Hardness and oxidation</topic><topic>Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties</topic><topic>Nanostructures</topic><topic>Physical vapour deposition</topic><topic>Physics</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Zeng, X.T.</creatorcontrib><creatorcontrib>Zhang, S.</creatorcontrib><creatorcontrib>Sun, C.Q.</creatorcontrib><creatorcontrib>Liu, Y.C.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>METADEX</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Zeng, X.T.</au><au>Zhang, S.</au><au>Sun, C.Q.</au><au>Liu, Y.C.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Nanometric-layered CrN/TiN thin films: mechanical strength and thermal stability</atitle><jtitle>Thin solid films</jtitle><date>2003-01-01</date><risdate>2003</risdate><volume>424</volume><issue>1</issue><spage>99</spage><epage>102</epage><pages>99-102</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>Nanometric-layered CrN/TiN coatings were deposited using unbalanced magnetron sputtering. The layered coating structure was characterised by X-ray diffractometry, and the mechanical properties were measured by nano-indentation and scratch test. High temperature annealing at 400–750 °C was carried out to investigate the thermal stability of the coating structure and mechanical properties. For comparison, samples of TiN and CrN deposited under similar conditions were also annealed and tested. The results showed that nano-layered CrN/TiN has excellent mechanical and thermal properties. Nano-hardness of 40 GPa and scratch adhesion of 80 N were achieved at a wavelength of 7.5 nm and a substrate bias of −80 V. The coating demonstrates application prospects in the stamping/cutting tools industry.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/S0040-6090(02)00921-5</doi><tpages>4</tpages></addata></record> |
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| subjects | Coatings Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Hardness and oxidation Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties Nanostructures Physical vapour deposition Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) |
| title | Nanometric-layered CrN/TiN thin films: mechanical strength and thermal stability |
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