Effects of ion bombardment and gas incorporation on the properties of Mo/a-Si:H multilayers for EUV applications

A study of Mo/a-Si:H multilayer for EUV mirrors produced by rf-magnetron sputtering in pure Ar, Xe and Ar/H 2 gas mixtures is presented. The high reflectance mirrors are designed for solar space experiments at 17, 19 and 30.4 nm and for the lithography applications at 13 nm. The multilayers are grow...

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Veröffentlicht in:	Surface & coatings technology 2003-09, Vol.174, p.40-48
Hauptverfasser:	Rigato, V., Patelli, A., Maggioni, G., Salmaso, G., Mattarello, V., Pelizzo, M.G., Nicolosi, P., Depero, L., Bontempi, E., Mazzoldi, P.
Format:	Artikel
Sprache:	eng
Schlagworte:	EUV Mirror Multilayer Soft X-Ray Sputtering
Online-Zugang:	Volltext
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