Microcrystalline silicon for large area thin film solar cells

We present a comprehensive study of microcrystalline silicon (μc-Si:H) solar cells prepared by plasma-enhanced chemical vapour deposition (PECVD) at 13.56 MHz excitation frequency. In the first step the cell development was performed in a small area PECVD reactor showing the relationship between the...

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Veröffentlicht in:	Thin solid films 2003-03, Vol.427 (1), p.157-165
Hauptverfasser:	Rech, B., Roschek, T., Repmann, T., Müller, J., Schmitz, R., Appenzeller, W.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Energy Exact sciences and technology High rate Microcrystalline silicon Natural energy PECVD Photovoltaic conversion Solar cell Solar cells. Photoelectrochemical cells Solar energy Tandem cell Up-scaling
Online-Zugang:	Volltext
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