Electroless deposition of Co(W) thin films

Thin films of cobalt that contain small amounts of tungsten [Co(W)] were deposited by the electroless process. Those films do not contain either phosphorus or boron which are included in most electroless cobalt films processes. The deposition bath for Co(W) thin films include Co ions, tungstate ions...

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Veröffentlicht in:	Microelectronic engineering 2003-11, Vol.70 (2), p.512-518
Hauptverfasser:	Sverdlov, Y, Shacham-Diamand, Y
Format:	Artikel
Sprache:	eng
Schlagworte:	Cobalt Electroless Tungsten
Online-Zugang:	Volltext
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