Correlation between structure, stress and optical properties in direct current sputtered molybdenum oxide films
MoO x films were prepared by reactive DC magnetron sputtering in an atmosphere of argon plus oxygen in an effort to determine the influence of the oxygen partial pressure on structural and optical properties of the films, as well as the resulting stress. Sputtering was carried out on glass and Si(10...
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Veröffentlicht in: | Thin solid films 2003-04, Vol.429 (1), p.135-143 |
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creator | Mohamed, S.H Kappertz, O Ngaruiya, J.M Leervad Pedersen, T.P Drese, R Wuttig, M |
description | MoO
x
films were prepared by reactive DC magnetron sputtering in an atmosphere of argon plus oxygen in an effort to determine the influence of the oxygen partial pressure on structural and optical properties of the films, as well as the resulting stress. Sputtering was carried out on glass and Si(100) substrates held at room temperature. X-Ray diffraction revealed the amorphous nature for most of the as-deposited films. Rutherford backscattering spectroscopy showed an almost linear increase in oxygen concentration at low oxygen partial pressure, while a small amount of excess oxygen was found at higher oxygen partial pressure. Optical spectroscopy and spectroscopic ellipsometry revealed that films, which were slightly substoichiometric, still showed polaron absorption of approximately 1.4 eV. For higher oxygen partial pressure, fully transparent films were deposited, which showed a slight increase in optical bandgap with increasing oxygen partial pressure, while the refractive index simultaneously decreased. This is in line with the slight decrease in film density observed in this regime by X-ray reflectometry. Possibly in this regime films possess an increasing amount of voids, since a moderate tensile stress is observed for these samples. On the other hand, a very high compressive stress is observed for low oxygen partial pressure. |
doi_str_mv | 10.1016/S0040-6090(03)00068-3 |
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films were prepared by reactive DC magnetron sputtering in an atmosphere of argon plus oxygen in an effort to determine the influence of the oxygen partial pressure on structural and optical properties of the films, as well as the resulting stress. Sputtering was carried out on glass and Si(100) substrates held at room temperature. X-Ray diffraction revealed the amorphous nature for most of the as-deposited films. Rutherford backscattering spectroscopy showed an almost linear increase in oxygen concentration at low oxygen partial pressure, while a small amount of excess oxygen was found at higher oxygen partial pressure. Optical spectroscopy and spectroscopic ellipsometry revealed that films, which were slightly substoichiometric, still showed polaron absorption of approximately 1.4 eV. For higher oxygen partial pressure, fully transparent films were deposited, which showed a slight increase in optical bandgap with increasing oxygen partial pressure, while the refractive index simultaneously decreased. This is in line with the slight decrease in film density observed in this regime by X-ray reflectometry. Possibly in this regime films possess an increasing amount of voids, since a moderate tensile stress is observed for these samples. On the other hand, a very high compressive stress is observed for low oxygen partial pressure.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/S0040-6090(03)00068-3</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Cross-disciplinary physics: materials science; rheology ; DC sputtering ; Deposition by sputtering ; Exact sciences and technology ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; MoO x ; Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity) ; Optical constants: refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity ; Optical properties ; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation ; Optical properties of bulk materials and thin films ; Physics ; Structural properties</subject><ispartof>Thin solid films, 2003-04, Vol.429 (1), p.135-143</ispartof><rights>2003 Elsevier Science B.V.</rights><rights>2003 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c465t-3c2a05e3a3b1b4477d04c55f0520920da5c29c219eb5eab14463573c2070c05c3</citedby><cites>FETCH-LOGICAL-c465t-3c2a05e3a3b1b4477d04c55f0520920da5c29c219eb5eab14463573c2070c05c3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/S0040-6090(03)00068-3$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3550,27924,27925,45995</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=14750123$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Mohamed, S.H</creatorcontrib><creatorcontrib>Kappertz, O</creatorcontrib><creatorcontrib>Ngaruiya, J.M</creatorcontrib><creatorcontrib>Leervad Pedersen, T.P</creatorcontrib><creatorcontrib>Drese, R</creatorcontrib><creatorcontrib>Wuttig, M</creatorcontrib><title>Correlation between structure, stress and optical properties in direct current sputtered molybdenum oxide films</title><title>Thin solid films</title><description>MoO
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films were prepared by reactive DC magnetron sputtering in an atmosphere of argon plus oxygen in an effort to determine the influence of the oxygen partial pressure on structural and optical properties of the films, as well as the resulting stress. Sputtering was carried out on glass and Si(100) substrates held at room temperature. X-Ray diffraction revealed the amorphous nature for most of the as-deposited films. Rutherford backscattering spectroscopy showed an almost linear increase in oxygen concentration at low oxygen partial pressure, while a small amount of excess oxygen was found at higher oxygen partial pressure. Optical spectroscopy and spectroscopic ellipsometry revealed that films, which were slightly substoichiometric, still showed polaron absorption of approximately 1.4 eV. For higher oxygen partial pressure, fully transparent films were deposited, which showed a slight increase in optical bandgap with increasing oxygen partial pressure, while the refractive index simultaneously decreased. This is in line with the slight decrease in film density observed in this regime by X-ray reflectometry. Possibly in this regime films possess an increasing amount of voids, since a moderate tensile stress is observed for these samples. 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Kappertz, O ; Ngaruiya, J.M ; Leervad Pedersen, T.P ; Drese, R ; Wuttig, M</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c465t-3c2a05e3a3b1b4477d04c55f0520920da5c29c219eb5eab14463573c2070c05c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2003</creationdate><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>DC sputtering</topic><topic>Deposition by sputtering</topic><topic>Exact sciences and technology</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>MoO x</topic><topic>Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity)</topic><topic>Optical constants: refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity</topic><topic>Optical properties</topic><topic>Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation</topic><topic>Optical properties of bulk materials and thin films</topic><topic>Physics</topic><topic>Structural properties</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Mohamed, S.H</creatorcontrib><creatorcontrib>Kappertz, O</creatorcontrib><creatorcontrib>Ngaruiya, J.M</creatorcontrib><creatorcontrib>Leervad Pedersen, T.P</creatorcontrib><creatorcontrib>Drese, R</creatorcontrib><creatorcontrib>Wuttig, M</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Ceramic Abstracts</collection><collection>Materials Research Database</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Mohamed, S.H</au><au>Kappertz, O</au><au>Ngaruiya, J.M</au><au>Leervad Pedersen, T.P</au><au>Drese, R</au><au>Wuttig, M</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Correlation between structure, stress and optical properties in direct current sputtered molybdenum oxide films</atitle><jtitle>Thin solid films</jtitle><date>2003-04-01</date><risdate>2003</risdate><volume>429</volume><issue>1</issue><spage>135</spage><epage>143</epage><pages>135-143</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>MoO
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films were prepared by reactive DC magnetron sputtering in an atmosphere of argon plus oxygen in an effort to determine the influence of the oxygen partial pressure on structural and optical properties of the films, as well as the resulting stress. Sputtering was carried out on glass and Si(100) substrates held at room temperature. X-Ray diffraction revealed the amorphous nature for most of the as-deposited films. Rutherford backscattering spectroscopy showed an almost linear increase in oxygen concentration at low oxygen partial pressure, while a small amount of excess oxygen was found at higher oxygen partial pressure. Optical spectroscopy and spectroscopic ellipsometry revealed that films, which were slightly substoichiometric, still showed polaron absorption of approximately 1.4 eV. For higher oxygen partial pressure, fully transparent films were deposited, which showed a slight increase in optical bandgap with increasing oxygen partial pressure, while the refractive index simultaneously decreased. This is in line with the slight decrease in film density observed in this regime by X-ray reflectometry. Possibly in this regime films possess an increasing amount of voids, since a moderate tensile stress is observed for these samples. On the other hand, a very high compressive stress is observed for low oxygen partial pressure.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/S0040-6090(03)00068-3</doi><tpages>9</tpages></addata></record> |
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subjects | Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology DC sputtering Deposition by sputtering Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy MoO x Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity) Optical constants: refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity Optical properties Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of bulk materials and thin films Physics Structural properties |
title | Correlation between structure, stress and optical properties in direct current sputtered molybdenum oxide films |
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