Comparison between large area dc-magnetron sputtered and e-beam evaporated molybdenum as thin film electrical contacts
Two different deposition techniques have been compared for obtaining large area Mo thin films as electrical back contacts in polycrystalline solar cells. The dc-magnetron sputtered layers have been made by varying dc-power (100–400 W), sputtering time (40–80 min) and Ar-mass flow rate (11–150 sccm)...
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| Veröffentlicht in: | Journal of materials processing technology 2003-12, Vol.143, p.326-331 |
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| container_title | Journal of materials processing technology |
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| creator | Martinez, M A Guillen, C |
| description | Two different deposition techniques have been compared for obtaining large area Mo thin films as electrical back contacts in polycrystalline solar cells. The dc-magnetron sputtered layers have been made by varying dc-power (100–400
W), sputtering time (40–80
min) and Ar-mass flow rate (11–150
sccm) while e-beam evaporated Mo has been fabricated at several powers (1400–2000
W). Adequate optoelectronic, structural and morphological properties without stress have been achieved when intermediate Ar-mass flow rates are used during the sputtering process. Evaporated samples present higher electrical resistivity than sputtered ones but still valid for photovoltaic purposes. The 500–550
°C heat treatments in Se atmosphere modify Mo features by an appearing MoO
2 layer on its surface. |
| doi_str_mv | 10.1016/S0924-0136(03)00436-9 |
| format | Article |
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W), sputtering time (40–80
min) and Ar-mass flow rate (11–150
sccm) while e-beam evaporated Mo has been fabricated at several powers (1400–2000
W). Adequate optoelectronic, structural and morphological properties without stress have been achieved when intermediate Ar-mass flow rates are used during the sputtering process. Evaporated samples present higher electrical resistivity than sputtered ones but still valid for photovoltaic purposes. The 500–550
°C heat treatments in Se atmosphere modify Mo features by an appearing MoO
2 layer on its surface.</description><identifier>ISSN: 0924-0136</identifier><identifier>DOI: 10.1016/S0924-0136(03)00436-9</identifier><language>eng</language><publisher>Elsevier B.V</publisher><subject>Evaporation ; Molybdenum ; Optical reflectance ; Roughness ; Sputtering ; X-ray diffraction</subject><ispartof>Journal of materials processing technology, 2003-12, Vol.143, p.326-331</ispartof><rights>2003 Elsevier Science B.V.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c379t-b0157fea380f433c582f88d130d07ebe3fc00c5cac5bf97c5c66d88d94af220c3</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S0924013603004369$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,776,780,3537,27901,27902,65306</link.rule.ids></links><search><creatorcontrib>Martinez, M A</creatorcontrib><creatorcontrib>Guillen, C</creatorcontrib><title>Comparison between large area dc-magnetron sputtered and e-beam evaporated molybdenum as thin film electrical contacts</title><title>Journal of materials processing technology</title><description>Two different deposition techniques have been compared for obtaining large area Mo thin films as electrical back contacts in polycrystalline solar cells. The dc-magnetron sputtered layers have been made by varying dc-power (100–400
W), sputtering time (40–80
min) and Ar-mass flow rate (11–150
sccm) while e-beam evaporated Mo has been fabricated at several powers (1400–2000
W). Adequate optoelectronic, structural and morphological properties without stress have been achieved when intermediate Ar-mass flow rates are used during the sputtering process. Evaporated samples present higher electrical resistivity than sputtered ones but still valid for photovoltaic purposes. The 500–550
°C heat treatments in Se atmosphere modify Mo features by an appearing MoO
2 layer on its surface.</description><subject>Evaporation</subject><subject>Molybdenum</subject><subject>Optical reflectance</subject><subject>Roughness</subject><subject>Sputtering</subject><subject>X-ray diffraction</subject><issn>0924-0136</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2003</creationdate><recordtype>article</recordtype><recordid>eNqFkEtLBDEQhOeg4PMnCDmJHkY7k53XSWTxBYIH9Rx6ko5GZpIxya74742uePXUTXdVQX1FccThjANvzh-hrxYlcNGcgDgFWIim7LeK3b_zTrEX4xsAb6Hrdov10k8zBhu9YwOlDyLHRgwvxDAQMq3KCV8cpZD_cV6lRIE0Q6cZlQPhxGiNsw-Y8nXy4-egya0mhpGlV-uYsWOWjKRSsApHprxLqFI8KLYNjpEOf-d-8Xx99bS8Le8fbu6Wl_elEm2fygF43RpC0YFZCKHqrjJdp7kADS0NJIwCULVCVQ-mb_PWNDoL-gWaqgIl9ovjTe4c_PuKYpKTjYrGER35VZRV22UmvM7CeiNUwccYyMg52AnDp-Qgv8nKH7LyG6EEIX_Iyj77LjY-yi3WloKMypJTpG3IraX29p-ELzlohRU</recordid><startdate>20031220</startdate><enddate>20031220</enddate><creator>Martinez, M A</creator><creator>Guillen, C</creator><general>Elsevier B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20031220</creationdate><title>Comparison between large area dc-magnetron sputtered and e-beam evaporated molybdenum as thin film electrical contacts</title><author>Martinez, M A ; Guillen, C</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c379t-b0157fea380f433c582f88d130d07ebe3fc00c5cac5bf97c5c66d88d94af220c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2003</creationdate><topic>Evaporation</topic><topic>Molybdenum</topic><topic>Optical reflectance</topic><topic>Roughness</topic><topic>Sputtering</topic><topic>X-ray diffraction</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Martinez, M A</creatorcontrib><creatorcontrib>Guillen, C</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of materials processing technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Martinez, M A</au><au>Guillen, C</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Comparison between large area dc-magnetron sputtered and e-beam evaporated molybdenum as thin film electrical contacts</atitle><jtitle>Journal of materials processing technology</jtitle><date>2003-12-20</date><risdate>2003</risdate><volume>143</volume><spage>326</spage><epage>331</epage><pages>326-331</pages><issn>0924-0136</issn><abstract>Two different deposition techniques have been compared for obtaining large area Mo thin films as electrical back contacts in polycrystalline solar cells. The dc-magnetron sputtered layers have been made by varying dc-power (100–400
W), sputtering time (40–80
min) and Ar-mass flow rate (11–150
sccm) while e-beam evaporated Mo has been fabricated at several powers (1400–2000
W). Adequate optoelectronic, structural and morphological properties without stress have been achieved when intermediate Ar-mass flow rates are used during the sputtering process. Evaporated samples present higher electrical resistivity than sputtered ones but still valid for photovoltaic purposes. The 500–550
°C heat treatments in Se atmosphere modify Mo features by an appearing MoO
2 layer on its surface.</abstract><pub>Elsevier B.V</pub><doi>10.1016/S0924-0136(03)00436-9</doi><tpages>6</tpages></addata></record> |
| fulltext | fulltext |
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| ispartof | Journal of materials processing technology, 2003-12, Vol.143, p.326-331 |
| issn | 0924-0136 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_27813615 |
| source | ScienceDirect Journals (5 years ago - present) |
| subjects | Evaporation Molybdenum Optical reflectance Roughness Sputtering X-ray diffraction |
| title | Comparison between large area dc-magnetron sputtered and e-beam evaporated molybdenum as thin film electrical contacts |
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