Characterization of the anisotropic chemical attack of ( h h l ) silicon plates in a TMAH 25 wt.% solution: micromachining and adequacy of the dissolution slowness surface
This paper is devoted to the study of the wet micromachining of 3D silicon structures in a water–TMAH 25 wt.%. In the first part emphasis is placed on changes in shapes with orientation for membranes and mesa etched on various ( h h l ) planes. The observed anisotropy of type 1 agrees with previous...
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| Veröffentlicht in: | Sensors and actuators. A. Physical. 2003-06, Vol.105 (1), p.62-75 |
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| container_title | Sensors and actuators. A. Physical. |
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| creator | Tellier, C.R. Charbonnieras, A.R. |
| description | This paper is devoted to the study of the wet micromachining of 3D silicon structures in a water–TMAH 25
wt.%. In the first part emphasis is placed on changes in shapes with orientation for membranes and mesa etched on various (
h
h
l
) planes. The observed anisotropy of type 1 agrees with previous conclusions. So, in the second part a previously proposed database is used to derive theoretical 3D etching shapes from the simulator TENSOSIM. Experimental and theoretical 3D etching shapes are analysed by combining dissolution criteria and stereographic projections of limiting facets. Finally we draw some conclusions on the adequacy of the dissolution slowness surface and suggest future possible adjustments. |
| doi_str_mv | 10.1016/S0924-4247(03)00064-5 |
| format | Article |
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h
h
l
) planes. The observed anisotropy of type 1 agrees with previous conclusions. So, in the second part a previously proposed database is used to derive theoretical 3D etching shapes from the simulator TENSOSIM. Experimental and theoretical 3D etching shapes are analysed by combining dissolution criteria and stereographic projections of limiting facets. Finally we draw some conclusions on the adequacy of the dissolution slowness surface and suggest future possible adjustments.</description><identifier>ISSN: 0924-4247</identifier><identifier>EISSN: 1873-3069</identifier><identifier>DOI: 10.1016/S0924-4247(03)00064-5</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Exact sciences and technology ; Laboratory procedures ; Metrology, measurements and laboratory procedures ; Micromachining ; Physics ; Silicon ; Simulation ; Stereographic analysis ; TMAH solution ; Workshop procedures (welding, machining, lubrication, bearings, etc.)</subject><ispartof>Sensors and actuators. A. Physical., 2003-06, Vol.105 (1), p.62-75</ispartof><rights>2003 Elsevier Science B.V.</rights><rights>2003 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c368t-c9f3f607813ad17483af4be4481a9a6bfa7aa52f7a647f28c2ba9654c5a478f73</citedby><cites>FETCH-LOGICAL-c368t-c9f3f607813ad17483af4be4481a9a6bfa7aa52f7a647f28c2ba9654c5a478f73</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/S0924-4247(03)00064-5$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3550,27924,27925,45995</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=14834810$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Tellier, C.R.</creatorcontrib><creatorcontrib>Charbonnieras, A.R.</creatorcontrib><title>Characterization of the anisotropic chemical attack of ( h h l ) silicon plates in a TMAH 25 wt.% solution: micromachining and adequacy of the dissolution slowness surface</title><title>Sensors and actuators. A. Physical.</title><description>This paper is devoted to the study of the wet micromachining of 3D silicon structures in a water–TMAH 25
wt.%. In the first part emphasis is placed on changes in shapes with orientation for membranes and mesa etched on various (
h
h
l
) planes. The observed anisotropy of type 1 agrees with previous conclusions. So, in the second part a previously proposed database is used to derive theoretical 3D etching shapes from the simulator TENSOSIM. Experimental and theoretical 3D etching shapes are analysed by combining dissolution criteria and stereographic projections of limiting facets. Finally we draw some conclusions on the adequacy of the dissolution slowness surface and suggest future possible adjustments.</description><subject>Exact sciences and technology</subject><subject>Laboratory procedures</subject><subject>Metrology, measurements and laboratory procedures</subject><subject>Micromachining</subject><subject>Physics</subject><subject>Silicon</subject><subject>Simulation</subject><subject>Stereographic analysis</subject><subject>TMAH solution</subject><subject>Workshop procedures (welding, machining, lubrication, bearings, etc.)</subject><issn>0924-4247</issn><issn>1873-3069</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2003</creationdate><recordtype>article</recordtype><recordid>eNqFkUFv1DAQhS0EEkvhJyDNpag9pDixEydcULUCilTEgXK2Zh2bGLzx1uNQlb_En8TbbeGIfPDlm_dm3mPsZc3Pal53r7_woZGVbKQ64eKUc97Jqn3EVnWvRCV4Nzxmq7_IU_aM6HuBhFBqxX6vJ0xosk3-F2YfZ4gO8mQBZ08xp7jzBsxkt95gAMwZzY89cgJTeQFOgXzwpsztAmZL4GdAuPp0fgFNCzf57BgohmWv_AaKSIpbNJOf_fytWIyAo71e0Nw-2I6eHnigEG9mSwS0JIfGPmdPHAayL-7_I_b1_bur9UV1-fnDx_X5ZWVE1-fKDE64jqu-FjjWSvYCndxYKfsaB-w2DhVi2ziFnVSu6U2zwaFrpWlRqt4pccReHXR3KV4vlrLeejI2BJxtXEg3RboE3xSwPYDlLKJknd4lv8V0q2uu99Xou2r0PnfNhb6rRrdl7vjeAKnE6hLOxtO_4bJyWZYX7u2Bs-Xan94mTcbb2djRJ2uyHqP_j9MfJeykjQ</recordid><startdate>20030615</startdate><enddate>20030615</enddate><creator>Tellier, C.R.</creator><creator>Charbonnieras, A.R.</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7TB</scope><scope>8FD</scope><scope>FR3</scope></search><sort><creationdate>20030615</creationdate><title>Characterization of the anisotropic chemical attack of ( h h l ) silicon plates in a TMAH 25 wt.% solution: micromachining and adequacy of the dissolution slowness surface</title><author>Tellier, C.R. ; Charbonnieras, A.R.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c368t-c9f3f607813ad17483af4be4481a9a6bfa7aa52f7a647f28c2ba9654c5a478f73</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2003</creationdate><topic>Exact sciences and technology</topic><topic>Laboratory procedures</topic><topic>Metrology, measurements and laboratory procedures</topic><topic>Micromachining</topic><topic>Physics</topic><topic>Silicon</topic><topic>Simulation</topic><topic>Stereographic analysis</topic><topic>TMAH solution</topic><topic>Workshop procedures (welding, machining, lubrication, bearings, etc.)</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Tellier, C.R.</creatorcontrib><creatorcontrib>Charbonnieras, A.R.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><jtitle>Sensors and actuators. A. Physical.</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Tellier, C.R.</au><au>Charbonnieras, A.R.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Characterization of the anisotropic chemical attack of ( h h l ) silicon plates in a TMAH 25 wt.% solution: micromachining and adequacy of the dissolution slowness surface</atitle><jtitle>Sensors and actuators. A. Physical.</jtitle><date>2003-06-15</date><risdate>2003</risdate><volume>105</volume><issue>1</issue><spage>62</spage><epage>75</epage><pages>62-75</pages><issn>0924-4247</issn><eissn>1873-3069</eissn><abstract>This paper is devoted to the study of the wet micromachining of 3D silicon structures in a water–TMAH 25
wt.%. In the first part emphasis is placed on changes in shapes with orientation for membranes and mesa etched on various (
h
h
l
) planes. The observed anisotropy of type 1 agrees with previous conclusions. So, in the second part a previously proposed database is used to derive theoretical 3D etching shapes from the simulator TENSOSIM. Experimental and theoretical 3D etching shapes are analysed by combining dissolution criteria and stereographic projections of limiting facets. Finally we draw some conclusions on the adequacy of the dissolution slowness surface and suggest future possible adjustments.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/S0924-4247(03)00064-5</doi><tpages>14</tpages></addata></record> |
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| identifier | ISSN: 0924-4247 |
| ispartof | Sensors and actuators. A. Physical., 2003-06, Vol.105 (1), p.62-75 |
| issn | 0924-4247 1873-3069 |
| language | eng |
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| source | Elsevier ScienceDirect Journals Complete |
| subjects | Exact sciences and technology Laboratory procedures Metrology, measurements and laboratory procedures Micromachining Physics Silicon Simulation Stereographic analysis TMAH solution Workshop procedures (welding, machining, lubrication, bearings, etc.) |
| title | Characterization of the anisotropic chemical attack of ( h h l ) silicon plates in a TMAH 25 wt.% solution: micromachining and adequacy of the dissolution slowness surface |
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