Characterisation of a BN magnetron sputtering process with an additional aluminium sputter electrode

The deposition of boron nitride (BN) films by r.f. magnetron sputtering of a hexagonal BN target with intended additional aluminium incorporation has been studied using various in situ plasma diagnostic techniques. The aluminium flux towards the substrates was supplied by an additional ring-shaped a...

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Veröffentlicht in:	Surface & coatings technology 2003-03, Vol.166 (1), p.51-59
Hauptverfasser:	Welzel, Th, Pfeifer, Th, Dunger, Th, Richter, F.
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminium Boron nitride Cross-disciplinary physics: materials science rheology Deposition by sputtering Exact sciences and technology Magnetron Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Reactive sputtering
Online-Zugang:	Volltext
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