Barrier studies on porous silk semiconductor dielectric

Barrier integrity of Ta-films deposited using the enhanced coverage by re-sputtering (EnCoRe 1 1 EnCoRe is a trademark of Applied Materials. ) barrier was investigated on untreated surfaces of blanket porous SiLK 2 2 SiLK is a trademark of The Dow Chemical Company. semiconductor dielectric (developm...

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Veröffentlicht in:	Microelectronic engineering 2003-11, Vol.70 (2), p.352-357
Hauptverfasser:	To&#x030B, kei, Zs, Iacopi, F., Richard, O., Waeterloos, J., Rozeveld, S., Beach, E., Mebarki, B., Mandrekar, T., Guggilla, S., Maex, K.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Barrier deposition Electronics EnCoRe Exact sciences and technology I-PVD Microelectronic fabrication (materials and surfaces technology) Porous SiLK semiconductor dielectric Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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