Batch processing of CMOS compatible feedthroughs

This paper presents a technique for batch fabrication of electrical feedthroughs in CMOS wafers. The presented process is designed with specific attention on industrial applicability. The electrical feedthroughs are processed entirely by low temperature, CMOS compatible processes. Hence, the process...

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Veröffentlicht in:	Microelectronic engineering 2003-06, Vol.67, p.487-494
Hauptverfasser:	Rasmussen, F.E., Heschel, M., Hansen, O.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Batch processing CMOS compatible Electrical feedthrough Electrodeposited photoresist Electronics Exact sciences and technology KOH resistant PECVD nitride Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online-Zugang:	Volltext
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