Wet etching of linear Fresnel zone plates for hard X-rays

We describe the fabrication and testing of a novel type of hard X-ray optics. The diffractive elements are generated by electron beam lithography and chemical wet etching of 〈110〉 oriented silicon substrates. Structures with widths down to 100 nm and very high aspect ratios were obtained using this...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Microelectronic engineering 2002-07, Vol.61, p.987-992
Hauptverfasser:	David, C., Nöhammer, B., Ziegler, E.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Electron-beam lithography Electronics Exact sciences and technology Fresnel zone plate Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Wet etching X-ray optics
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!