A Laplace sensitivity operator enhances the calculation efficiency of OCD metrology
In integrated circuit manufacturing, optical critical dimension measurement is an efficient and non-destructive metrology method. It is also a model-based metrology in which a numerical model of the target device is formed to simulate the optical spectrum. The result is then reconstructed by fitting...
Gespeichert in:
| Veröffentlicht in: | Optics express 2023-01, Vol.31 (2), p.2147-2160 |
|---|---|
| Hauptverfasser: | , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!