Study of different triazole derivative inhibitors to protect copper against pitting corrosion
Electrochemical experiments were performed to study the inhibitive effect towards copper corrosion of three organic compounds: namely, benzotriazole, 1-hydroxybenzotriazole and 3-amino 1,2,4-triazole. Statistical analysis of pit nucleation times showed that 3-amino 1,2,4-triazole exhibited the most...
Gespeichert in:
Veröffentlicht in: | Journal of applied electrochemistry 2000-08, Vol.30 (8), p.959-966 |
---|---|
Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 966 |
---|---|
container_issue | 8 |
container_start_page | 959 |
container_title | Journal of applied electrochemistry |
container_volume | 30 |
creator | QAFSAOUI, W BLANC, Ch PEBERE, N SRHIRI, A MANKOWSKI, G |
description | Electrochemical experiments were performed to study the inhibitive effect towards copper corrosion of three organic compounds: namely, benzotriazole, 1-hydroxybenzotriazole and 3-amino 1,2,4-triazole. Statistical analysis of pit nucleation times showed that 3-amino 1,2,4-triazole exhibited the most significant inhibitive effect towards pitting. However, impedance measurements revealed that this compound produced a thinning of the passive film. This was corroborated by X-ray photoelectron spectroscopy. Results showed that copper pitting resistance could not be explained only by characterizing the protectiveness of the passive film. |
doi_str_mv | 10.1023/A:1004056527379 |
format | Article |
fullrecord | <record><control><sourceid>proquest_pasca</sourceid><recordid>TN_cdi_proquest_miscellaneous_27742853</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>27742853</sourcerecordid><originalsourceid>FETCH-LOGICAL-c259t-efb6019514cee43138f2a4df0325e2500870b8b546e4c54cea0d910045c332f13</originalsourceid><addsrcrecordid>eNotj0tLxDAUhYMoOI6u3WYh7qo3rzZ1N4gvGHChghspaXozRjpNTTID46-34qwOHD4-ziHknMEVAy6uFzcMQIIqFa9EVR-QGVMVL7QW-pDMADgrdM3ej8lJSl8AUPNSzsjHS950Oxoc7bxzGHHINEdvfkKPtMPotyb7LVI_fPrW5xATzYGOMWS0mdowjhipWRk_pExHn7MfVlMdY0g-DKfkyJk-4dk-5-Tt_u719rFYPj883S6WheWqzgW6tgRWKyYtohRMaMeN7BwIrpArAF1Bq1slS5RWTZCBrv57q6wQ3DExJ5f_3mnY9wZTbtY-Wex7M2DYpIZXleRaiQm82IMmWdO7aAbrUzNGvzZx1zBZVaXg4hezzWSp</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>27742853</pqid></control><display><type>article</type><title>Study of different triazole derivative inhibitors to protect copper against pitting corrosion</title><source>SpringerLink Journals - AutoHoldings</source><creator>QAFSAOUI, W ; BLANC, Ch ; PEBERE, N ; SRHIRI, A ; MANKOWSKI, G</creator><creatorcontrib>QAFSAOUI, W ; BLANC, Ch ; PEBERE, N ; SRHIRI, A ; MANKOWSKI, G</creatorcontrib><description>Electrochemical experiments were performed to study the inhibitive effect towards copper corrosion of three organic compounds: namely, benzotriazole, 1-hydroxybenzotriazole and 3-amino 1,2,4-triazole. Statistical analysis of pit nucleation times showed that 3-amino 1,2,4-triazole exhibited the most significant inhibitive effect towards pitting. However, impedance measurements revealed that this compound produced a thinning of the passive film. This was corroborated by X-ray photoelectron spectroscopy. Results showed that copper pitting resistance could not be explained only by characterizing the protectiveness of the passive film.</description><identifier>ISSN: 0021-891X</identifier><identifier>EISSN: 1572-8838</identifier><identifier>DOI: 10.1023/A:1004056527379</identifier><identifier>CODEN: JAELBJ</identifier><language>eng</language><publisher>Heidelberg: Springer</publisher><subject>Applied sciences ; Corrosion ; Corrosion prevention ; Exact sciences and technology ; Metals. Metallurgy</subject><ispartof>Journal of applied electrochemistry, 2000-08, Vol.30 (8), p.959-966</ispartof><rights>2000 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c259t-efb6019514cee43138f2a4df0325e2500870b8b546e4c54cea0d910045c332f13</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=1477632$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>QAFSAOUI, W</creatorcontrib><creatorcontrib>BLANC, Ch</creatorcontrib><creatorcontrib>PEBERE, N</creatorcontrib><creatorcontrib>SRHIRI, A</creatorcontrib><creatorcontrib>MANKOWSKI, G</creatorcontrib><title>Study of different triazole derivative inhibitors to protect copper against pitting corrosion</title><title>Journal of applied electrochemistry</title><description>Electrochemical experiments were performed to study the inhibitive effect towards copper corrosion of three organic compounds: namely, benzotriazole, 1-hydroxybenzotriazole and 3-amino 1,2,4-triazole. Statistical analysis of pit nucleation times showed that 3-amino 1,2,4-triazole exhibited the most significant inhibitive effect towards pitting. However, impedance measurements revealed that this compound produced a thinning of the passive film. This was corroborated by X-ray photoelectron spectroscopy. Results showed that copper pitting resistance could not be explained only by characterizing the protectiveness of the passive film.</description><subject>Applied sciences</subject><subject>Corrosion</subject><subject>Corrosion prevention</subject><subject>Exact sciences and technology</subject><subject>Metals. Metallurgy</subject><issn>0021-891X</issn><issn>1572-8838</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><recordid>eNotj0tLxDAUhYMoOI6u3WYh7qo3rzZ1N4gvGHChghspaXozRjpNTTID46-34qwOHD4-ziHknMEVAy6uFzcMQIIqFa9EVR-QGVMVL7QW-pDMADgrdM3ej8lJSl8AUPNSzsjHS950Oxoc7bxzGHHINEdvfkKPtMPotyb7LVI_fPrW5xATzYGOMWS0mdowjhipWRk_pExHn7MfVlMdY0g-DKfkyJk-4dk-5-Tt_u719rFYPj883S6WheWqzgW6tgRWKyYtohRMaMeN7BwIrpArAF1Bq1slS5RWTZCBrv57q6wQ3DExJ5f_3mnY9wZTbtY-Wex7M2DYpIZXleRaiQm82IMmWdO7aAbrUzNGvzZx1zBZVaXg4hezzWSp</recordid><startdate>20000801</startdate><enddate>20000801</enddate><creator>QAFSAOUI, W</creator><creator>BLANC, Ch</creator><creator>PEBERE, N</creator><creator>SRHIRI, A</creator><creator>MANKOWSKI, G</creator><general>Springer</general><scope>IQODW</scope><scope>7SE</scope><scope>8BQ</scope><scope>8FD</scope><scope>H8G</scope><scope>JG9</scope></search><sort><creationdate>20000801</creationdate><title>Study of different triazole derivative inhibitors to protect copper against pitting corrosion</title><author>QAFSAOUI, W ; BLANC, Ch ; PEBERE, N ; SRHIRI, A ; MANKOWSKI, G</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c259t-efb6019514cee43138f2a4df0325e2500870b8b546e4c54cea0d910045c332f13</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2000</creationdate><topic>Applied sciences</topic><topic>Corrosion</topic><topic>Corrosion prevention</topic><topic>Exact sciences and technology</topic><topic>Metals. Metallurgy</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>QAFSAOUI, W</creatorcontrib><creatorcontrib>BLANC, Ch</creatorcontrib><creatorcontrib>PEBERE, N</creatorcontrib><creatorcontrib>SRHIRI, A</creatorcontrib><creatorcontrib>MANKOWSKI, G</creatorcontrib><collection>Pascal-Francis</collection><collection>Corrosion Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Copper Technical Reference Library</collection><collection>Materials Research Database</collection><jtitle>Journal of applied electrochemistry</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>QAFSAOUI, W</au><au>BLANC, Ch</au><au>PEBERE, N</au><au>SRHIRI, A</au><au>MANKOWSKI, G</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Study of different triazole derivative inhibitors to protect copper against pitting corrosion</atitle><jtitle>Journal of applied electrochemistry</jtitle><date>2000-08-01</date><risdate>2000</risdate><volume>30</volume><issue>8</issue><spage>959</spage><epage>966</epage><pages>959-966</pages><issn>0021-891X</issn><eissn>1572-8838</eissn><coden>JAELBJ</coden><abstract>Electrochemical experiments were performed to study the inhibitive effect towards copper corrosion of three organic compounds: namely, benzotriazole, 1-hydroxybenzotriazole and 3-amino 1,2,4-triazole. Statistical analysis of pit nucleation times showed that 3-amino 1,2,4-triazole exhibited the most significant inhibitive effect towards pitting. However, impedance measurements revealed that this compound produced a thinning of the passive film. This was corroborated by X-ray photoelectron spectroscopy. Results showed that copper pitting resistance could not be explained only by characterizing the protectiveness of the passive film.</abstract><cop>Heidelberg</cop><pub>Springer</pub><doi>10.1023/A:1004056527379</doi><tpages>8</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0021-891X |
ispartof | Journal of applied electrochemistry, 2000-08, Vol.30 (8), p.959-966 |
issn | 0021-891X 1572-8838 |
language | eng |
recordid | cdi_proquest_miscellaneous_27742853 |
source | SpringerLink Journals - AutoHoldings |
subjects | Applied sciences Corrosion Corrosion prevention Exact sciences and technology Metals. Metallurgy |
title | Study of different triazole derivative inhibitors to protect copper against pitting corrosion |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-03T09%3A07%3A18IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_pasca&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Study%20of%20different%20triazole%20derivative%20inhibitors%20to%20protect%20copper%20against%20pitting%20corrosion&rft.jtitle=Journal%20of%20applied%20electrochemistry&rft.au=QAFSAOUI,%20W&rft.date=2000-08-01&rft.volume=30&rft.issue=8&rft.spage=959&rft.epage=966&rft.pages=959-966&rft.issn=0021-891X&rft.eissn=1572-8838&rft.coden=JAELBJ&rft_id=info:doi/10.1023/A:1004056527379&rft_dat=%3Cproquest_pasca%3E27742853%3C/proquest_pasca%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=27742853&rft_id=info:pmid/&rfr_iscdi=true |