Soft x-rays for deep sub-100 nm lithography, with and without masks

The development of micro- and nanofabrication, their applications, and their dependent industries has progressed to a point where a bifurcation of technology development will likely occur. On the one hand, the semiconductor industry (at least in the USA) has decided to develop EUV and SCALPEL to mee...

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Veröffentlicht in:	Microelectronic engineering 2000-06, Vol.53 (1), p.77-84
Hauptverfasser:	Smith, Henry I., Carter, D.J.D., Meinhold, M., Moon, E.E., Lim, M.H., Ferrera, J., Walsh, M., Gil, D., Menon, R.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Design. Technologies. Operation analysis. Testing Electronics Exact sciences and technology Integrated circuits Lithography, masks and pattern transfer Microelectronic fabrication (materials and surfaces technology) Microelectronics: LSI, VLSI, ULSI integrated circuit fabrication technology Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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