The optical and structural properties of AlN thin films characterized by spectroscopic ellipsometry

Spectroscopic ellipsometry (SE) was used to characterize AlN thin films deposited on SiO sub(2)/Si substrates by r.f. magnetron sputtering. Refractive index and thickness of each layer were extracted from the SE data analysis employing a multi-layer model and effective medium approximation. Non-dest...

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Veröffentlicht in:	Thin solid films 2000-06, Vol.368 (1), p.67-73
Hauptverfasser:	Joo, H.Y, Kim, H.J, Kim, S.J, Kim, S.Y
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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