An in situ sheet resistance study of oxidative-treated indium tin oxide substrates for organic light emitting display applications
Indium tin oxide (ITO) substrates are subjected to oxygen plasma and UV ozone treatments. It is observed that the treatments produced a surface layer rich in oxygen, as investigated by X-ray photoelectron spectroscopy (XPS), and this is correlated with the sheet resistance of ITO measured by a four-...
Gespeichert in:
| Veröffentlicht in: | Thin solid films 2002-09, Vol.417 (1), p.116-119 |
|---|---|
| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 119 |
|---|---|
| container_issue | 1 |
| container_start_page | 116 |
| container_title | Thin solid films |
| container_volume | 417 |
| creator | Low, B.L. Zhu, F.R. Zhang, K.R. Chua, S.J. |
| description | Indium tin oxide (ITO) substrates are subjected to oxygen plasma and UV ozone treatments. It is observed that the treatments produced a surface layer rich in oxygen, as investigated by X-ray photoelectron spectroscopy (XPS), and this is correlated with the sheet resistance of ITO measured by a four-point probe. A method has been devised to measure the change in the sheet resistance more prominently and this measurement is carried out under purified nitrogen atmosphere after the ITO is being treated. With an oxygen-rich ITO surface layer formed on ITO after the oxidative treatments, the resistance of ITO is considered to be that of a parallel-resistor combination and the thickness of the surface layer is being estimated based on this approach. |
| doi_str_mv | 10.1016/S0040-6090(02)00598-9 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_27609557</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0040609002005989</els_id><sourcerecordid>27609557</sourcerecordid><originalsourceid>FETCH-LOGICAL-c434t-e1b82eca7725cca853f0354fc3767978318f0842c48fee6aca59e70c87dbe90c3</originalsourceid><addsrcrecordid>eNqFkE2LFDEQhoMoOK7-BCEXRQ-tlaR7kpxkWfyCBQ_qOWTSldlIT6dNpRfn6i83s7Po0VMd6nnfoh7Gngt4I0Bs334F6KHbgoVXIF8DDNZ09gHbCKNtJ7USD9nmL_KYPSH6AQBCSrVhvy9nnmZOqa6cbhArL0iJqp8DcqrreOQ58vwrjb6mW-xqQV9xbJkxrQdeW_a0bOy6o1rajnjMheey93MKfEr7m8rxkGpD93xMtEz-yP2yTCm0yjzTU_Yo-onw2f28YN8_vP929am7_vLx89XldRd61dcOxc5IDF5rOYTgzaAiqKGPQemtttooYSKYXobeRMStD36wqCEYPe7QQlAX7OW5dyn554pU3SFRwGnyM-aVnNTNzzDoBg5nMJRMVDC6paSDL0cnwJ2Muzvj7qTTgXR3xp1tuRf3BzwFP8XSJCb6F1bWCpDQuHdnDtu3twmLo5CwCR9TwVDdmNN_Lv0BXF-Ybg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>27609557</pqid></control><display><type>article</type><title>An in situ sheet resistance study of oxidative-treated indium tin oxide substrates for organic light emitting display applications</title><source>Elsevier ScienceDirect Journals</source><creator>Low, B.L. ; Zhu, F.R. ; Zhang, K.R. ; Chua, S.J.</creator><creatorcontrib>Low, B.L. ; Zhu, F.R. ; Zhang, K.R. ; Chua, S.J.</creatorcontrib><description>Indium tin oxide (ITO) substrates are subjected to oxygen plasma and UV ozone treatments. It is observed that the treatments produced a surface layer rich in oxygen, as investigated by X-ray photoelectron spectroscopy (XPS), and this is correlated with the sheet resistance of ITO measured by a four-point probe. A method has been devised to measure the change in the sheet resistance more prominently and this measurement is carried out under purified nitrogen atmosphere after the ITO is being treated. With an oxygen-rich ITO surface layer formed on ITO after the oxidative treatments, the resistance of ITO is considered to be that of a parallel-resistor combination and the thickness of the surface layer is being estimated based on this approach.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/S0040-6090(02)00598-9</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Anode modification ; Applied sciences ; Display ; Electronics ; Exact sciences and technology ; Organic light-emitting diodes ; Sheet resistance</subject><ispartof>Thin solid films, 2002-09, Vol.417 (1), p.116-119</ispartof><rights>2002 Elsevier Science B.V.</rights><rights>2003 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c434t-e1b82eca7725cca853f0354fc3767978318f0842c48fee6aca59e70c87dbe90c3</citedby><cites>FETCH-LOGICAL-c434t-e1b82eca7725cca853f0354fc3767978318f0842c48fee6aca59e70c87dbe90c3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S0040609002005989$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>309,310,314,776,780,785,786,3536,23910,23911,25119,27903,27904,65309</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=13991020$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Low, B.L.</creatorcontrib><creatorcontrib>Zhu, F.R.</creatorcontrib><creatorcontrib>Zhang, K.R.</creatorcontrib><creatorcontrib>Chua, S.J.</creatorcontrib><title>An in situ sheet resistance study of oxidative-treated indium tin oxide substrates for organic light emitting display applications</title><title>Thin solid films</title><description>Indium tin oxide (ITO) substrates are subjected to oxygen plasma and UV ozone treatments. It is observed that the treatments produced a surface layer rich in oxygen, as investigated by X-ray photoelectron spectroscopy (XPS), and this is correlated with the sheet resistance of ITO measured by a four-point probe. A method has been devised to measure the change in the sheet resistance more prominently and this measurement is carried out under purified nitrogen atmosphere after the ITO is being treated. With an oxygen-rich ITO surface layer formed on ITO after the oxidative treatments, the resistance of ITO is considered to be that of a parallel-resistor combination and the thickness of the surface layer is being estimated based on this approach.</description><subject>Anode modification</subject><subject>Applied sciences</subject><subject>Display</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Organic light-emitting diodes</subject><subject>Sheet resistance</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2002</creationdate><recordtype>article</recordtype><recordid>eNqFkE2LFDEQhoMoOK7-BCEXRQ-tlaR7kpxkWfyCBQ_qOWTSldlIT6dNpRfn6i83s7Po0VMd6nnfoh7Gngt4I0Bs334F6KHbgoVXIF8DDNZ09gHbCKNtJ7USD9nmL_KYPSH6AQBCSrVhvy9nnmZOqa6cbhArL0iJqp8DcqrreOQ58vwrjb6mW-xqQV9xbJkxrQdeW_a0bOy6o1rajnjMheey93MKfEr7m8rxkGpD93xMtEz-yP2yTCm0yjzTU_Yo-onw2f28YN8_vP929am7_vLx89XldRd61dcOxc5IDF5rOYTgzaAiqKGPQemtttooYSKYXobeRMStD36wqCEYPe7QQlAX7OW5dyn554pU3SFRwGnyM-aVnNTNzzDoBg5nMJRMVDC6paSDL0cnwJ2Muzvj7qTTgXR3xp1tuRf3BzwFP8XSJCb6F1bWCpDQuHdnDtu3twmLo5CwCR9TwVDdmNN_Lv0BXF-Ybg</recordid><startdate>20020930</startdate><enddate>20020930</enddate><creator>Low, B.L.</creator><creator>Zhu, F.R.</creator><creator>Zhang, K.R.</creator><creator>Chua, S.J.</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20020930</creationdate><title>An in situ sheet resistance study of oxidative-treated indium tin oxide substrates for organic light emitting display applications</title><author>Low, B.L. ; Zhu, F.R. ; Zhang, K.R. ; Chua, S.J.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c434t-e1b82eca7725cca853f0354fc3767978318f0842c48fee6aca59e70c87dbe90c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2002</creationdate><topic>Anode modification</topic><topic>Applied sciences</topic><topic>Display</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Organic light-emitting diodes</topic><topic>Sheet resistance</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Low, B.L.</creatorcontrib><creatorcontrib>Zhu, F.R.</creatorcontrib><creatorcontrib>Zhang, K.R.</creatorcontrib><creatorcontrib>Chua, S.J.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Low, B.L.</au><au>Zhu, F.R.</au><au>Zhang, K.R.</au><au>Chua, S.J.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>An in situ sheet resistance study of oxidative-treated indium tin oxide substrates for organic light emitting display applications</atitle><jtitle>Thin solid films</jtitle><date>2002-09-30</date><risdate>2002</risdate><volume>417</volume><issue>1</issue><spage>116</spage><epage>119</epage><pages>116-119</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>Indium tin oxide (ITO) substrates are subjected to oxygen plasma and UV ozone treatments. It is observed that the treatments produced a surface layer rich in oxygen, as investigated by X-ray photoelectron spectroscopy (XPS), and this is correlated with the sheet resistance of ITO measured by a four-point probe. A method has been devised to measure the change in the sheet resistance more prominently and this measurement is carried out under purified nitrogen atmosphere after the ITO is being treated. With an oxygen-rich ITO surface layer formed on ITO after the oxidative treatments, the resistance of ITO is considered to be that of a parallel-resistor combination and the thickness of the surface layer is being estimated based on this approach.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/S0040-6090(02)00598-9</doi><tpages>4</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0040-6090 |
| ispartof | Thin solid films, 2002-09, Vol.417 (1), p.116-119 |
| issn | 0040-6090 1879-2731 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_27609557 |
| source | Elsevier ScienceDirect Journals |
| subjects | Anode modification Applied sciences Display Electronics Exact sciences and technology Organic light-emitting diodes Sheet resistance |
| title | An in situ sheet resistance study of oxidative-treated indium tin oxide substrates for organic light emitting display applications |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T23%3A44%3A34IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=An%20in%20situ%20sheet%20resistance%20study%20of%20oxidative-treated%20indium%20tin%20oxide%20substrates%20for%20organic%20light%20emitting%20display%20applications&rft.jtitle=Thin%20solid%20films&rft.au=Low,%20B.L.&rft.date=2002-09-30&rft.volume=417&rft.issue=1&rft.spage=116&rft.epage=119&rft.pages=116-119&rft.issn=0040-6090&rft.eissn=1879-2731&rft.coden=THSFAP&rft_id=info:doi/10.1016/S0040-6090(02)00598-9&rft_dat=%3Cproquest_cross%3E27609557%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=27609557&rft_id=info:pmid/&rft_els_id=S0040609002005989&rfr_iscdi=true |