Nickel β-diketonate complexes as precursors for the photochemical deposition of nickel oxide thin films
In this paper we report the utilization of amorphous films of Ni(II) diketonate complexes as precursors for the direct photochemical deposition of thin films of nickel oxides. The UV photolysis of amorphous thin solid films of Ni(PhCOCHCOPr)2 results in the loss of all ligands from the coordination...
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Veröffentlicht in: | Journal of materials science 2000-10, Vol.35 (19), p.4873-4877 |
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creator | BUONO-CORE, G. E TEJOS, M ALVEAL, G HILL, R. H |
description | In this paper we report the utilization of amorphous films of Ni(II) diketonate complexes as precursors for the direct photochemical deposition of thin films of nickel oxides. The UV photolysis of amorphous thin solid films of Ni(PhCOCHCOPr)2 results in the loss of all ligands from the coordination sphere. The acetylacetone derivative was chosen for the solid state photochemistry because the presence of the long carbon chains or highly branched hydrocarbons substituents, lowers the intermolecular interactions and allows the formation of high quality films upon spin-coating. The surface morphology of the films was observed by scanning electron microscopy and showed excellent quality without islands or other imperfections. The formation of NiO was determined by X-ray difraction and Auger spectroscopy analysis. The photochemical deposition of patterns of NiO was shown to be compatible with standard lithographic techniques by the lithography of 100 × 2 μm lines. |
doi_str_mv | 10.1023/A:1004857720136 |
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The photochemical deposition of patterns of NiO was shown to be compatible with standard lithographic techniques by the lithography of 100 × 2 μm lines.</description><identifier>ISSN: 0022-2461</identifier><identifier>EISSN: 1573-4803</identifier><identifier>DOI: 10.1023/A:1004857720136</identifier><identifier>CODEN: JMTSAS</identifier><language>eng</language><publisher>Heidelberg: Springer</publisher><subject>Acetylacetone ; Auger spectroscopy ; Chain branching ; Cross-disciplinary physics: materials science; rheology ; Deposition ; Exact sciences and technology ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Morphology ; Nickel oxides ; Photochemistry ; Photolysis ; Physics ; Precursors ; Scanning electron microscopy ; Spin coating ; Thin films</subject><ispartof>Journal of materials science, 2000-10, Vol.35 (19), p.4873-4877</ispartof><rights>2000 INIST-CNRS</rights><rights>Journal of Materials Science is a copyright of Springer, (2000). 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H</creatorcontrib><title>Nickel β-diketonate complexes as precursors for the photochemical deposition of nickel oxide thin films</title><title>Journal of materials science</title><description>In this paper we report the utilization of amorphous films of Ni(II) diketonate complexes as precursors for the direct photochemical deposition of thin films of nickel oxides. The UV photolysis of amorphous thin solid films of Ni(PhCOCHCOPr)2 results in the loss of all ligands from the coordination sphere. The acetylacetone derivative was chosen for the solid state photochemistry because the presence of the long carbon chains or highly branched hydrocarbons substituents, lowers the intermolecular interactions and allows the formation of high quality films upon spin-coating. The surface morphology of the films was observed by scanning electron microscopy and showed excellent quality without islands or other imperfections. The formation of NiO was determined by X-ray difraction and Auger spectroscopy analysis. The photochemical deposition of patterns of NiO was shown to be compatible with standard lithographic techniques by the lithography of 100 × 2 μm lines.</description><subject>Acetylacetone</subject><subject>Auger spectroscopy</subject><subject>Chain branching</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Deposition</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Morphology</subject><subject>Nickel oxides</subject><subject>Photochemistry</subject><subject>Photolysis</subject><subject>Physics</subject><subject>Precursors</subject><subject>Scanning electron microscopy</subject><subject>Spin coating</subject><subject>Thin films</subject><issn>0022-2461</issn><issn>1573-4803</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><sourceid>AFKRA</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><recordid>eNqN0LtOwzAYBWALgUQpzKyWQGyB37c4YasQN6mCpXvk-qK4TeJgJ1J5LR6EZyKonZiYzvLpSOcgdEnglgBld4t7AsALISUFwvIjNCNCsowXwI7RDIDSjPKcnKKzlDYAICQlM1S_eb21Df7-yozf2iF0arBYh7Zv7M4mrBLuo9VjTCEm7ELEQ21xX4ch6Nq2XqsGG9uH5AcfOhwc7vaFYeeNnbDvsPNNm87RiVNNsheHnKPV0-Pq4SVbvj-_PiyWWU8lHTINUlNe5MCUI8CIA2cEMUoXWoASxqwtKZgrHFEl57-yMEauTZkrXa5zNkc3-9o-ho_RpqFqfdK2aVRnw5gqKnMQgsM_oCg4SDbBqz9wE8bYTRsqSkVZEgFcTOr6oFSaPnFRddqnqo--VfGzIoJCzgn7AR76glE</recordid><startdate>20001001</startdate><enddate>20001001</enddate><creator>BUONO-CORE, G. 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E</au><au>TEJOS, M</au><au>ALVEAL, G</au><au>HILL, R. H</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Nickel β-diketonate complexes as precursors for the photochemical deposition of nickel oxide thin films</atitle><jtitle>Journal of materials science</jtitle><date>2000-10-01</date><risdate>2000</risdate><volume>35</volume><issue>19</issue><spage>4873</spage><epage>4877</epage><pages>4873-4877</pages><issn>0022-2461</issn><eissn>1573-4803</eissn><coden>JMTSAS</coden><abstract>In this paper we report the utilization of amorphous films of Ni(II) diketonate complexes as precursors for the direct photochemical deposition of thin films of nickel oxides. The UV photolysis of amorphous thin solid films of Ni(PhCOCHCOPr)2 results in the loss of all ligands from the coordination sphere. The acetylacetone derivative was chosen for the solid state photochemistry because the presence of the long carbon chains or highly branched hydrocarbons substituents, lowers the intermolecular interactions and allows the formation of high quality films upon spin-coating. The surface morphology of the films was observed by scanning electron microscopy and showed excellent quality without islands or other imperfections. The formation of NiO was determined by X-ray difraction and Auger spectroscopy analysis. The photochemical deposition of patterns of NiO was shown to be compatible with standard lithographic techniques by the lithography of 100 × 2 μm lines.</abstract><cop>Heidelberg</cop><pub>Springer</pub><doi>10.1023/A:1004857720136</doi><tpages>5</tpages></addata></record> |
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subjects | Acetylacetone Auger spectroscopy Chain branching Cross-disciplinary physics: materials science rheology Deposition Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Morphology Nickel oxides Photochemistry Photolysis Physics Precursors Scanning electron microscopy Spin coating Thin films |
title | Nickel β-diketonate complexes as precursors for the photochemical deposition of nickel oxide thin films |
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