High volume RF/microwave SOI-CMOS integrated circuits

Radio frequency (RF) microwave silicon on insulator-complementary metal oxide semiconductor (SOI-CMOS) integrated circuits has significant speed and power advantages. It reduces junction capacitance, thereby inducing a reduction of the total capacitance. It also lowers threshold voltage temperature...

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Veröffentlicht in:Analog integrated circuits and signal processing 2000-11, Vol.25 (2), p.85-91
Hauptverfasser: Auberton-Herve, A J, Barge, T, Maleville, C, Wittkower, A
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creator Auberton-Herve, A J
Barge, T
Maleville, C
Wittkower, A
description Radio frequency (RF) microwave silicon on insulator-complementary metal oxide semiconductor (SOI-CMOS) integrated circuits has significant speed and power advantages. It reduces junction capacitance, thereby inducing a reduction of the total capacitance. It also lowers threshold voltage temperature sensitivity. SOI material is the appropriate material for advance CMOS applications.
doi_str_mv 10.1023/A:1008346430921
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title High volume RF/microwave SOI-CMOS integrated circuits
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