High volume RF/microwave SOI-CMOS integrated circuits
Radio frequency (RF) microwave silicon on insulator-complementary metal oxide semiconductor (SOI-CMOS) integrated circuits has significant speed and power advantages. It reduces junction capacitance, thereby inducing a reduction of the total capacitance. It also lowers threshold voltage temperature...
Gespeichert in:
Veröffentlicht in: | Analog integrated circuits and signal processing 2000-11, Vol.25 (2), p.85-91 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 91 |
---|---|
container_issue | 2 |
container_start_page | 85 |
container_title | Analog integrated circuits and signal processing |
container_volume | 25 |
creator | Auberton-Herve, A J Barge, T Maleville, C Wittkower, A |
description | Radio frequency (RF) microwave silicon on insulator-complementary metal oxide semiconductor (SOI-CMOS) integrated circuits has significant speed and power advantages. It reduces junction capacitance, thereby inducing a reduction of the total capacitance. It also lowers threshold voltage temperature sensitivity. SOI material is the appropriate material for advance CMOS applications. |
doi_str_mv | 10.1023/A:1008346430921 |
format | Article |
fullrecord | <record><control><sourceid>proquest</sourceid><recordid>TN_cdi_proquest_miscellaneous_27541246</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>27541246</sourcerecordid><originalsourceid>FETCH-LOGICAL-p184t-70697311aee695602026aa495f61bd421c04aa9165f0e7d61cf1a3e6dd85b3143</originalsourceid><addsrcrecordid>eNotzM9PwjAUAOAeNBGRs9eevE3e669t3sgiQoJZIngmpX3Dmo3h2uG_r4mevtvH2D3CI4KQ88UTAhRSGSWhFHjFJr_oDEHCDbuN8RMARK5gwvQqHD_4pW_Hjvjbct4FN_Tf9kJ8W6-z6rXe8nBKdBxsIs9dGNwYUrxj141tI83-nbL35fOuWmWb-mVdLTbZGQuVshxMmUtES2RKbUCAMNaqUjcGD14JdKCsLdHoBij3Bl2DVpLxvtAHiUpO2cPfex76r5Fi2nchOmpbe6J-jHuRa4VCGfkDASJFCA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>27541246</pqid></control><display><type>article</type><title>High volume RF/microwave SOI-CMOS integrated circuits</title><source>SpringerNature Journals</source><creator>Auberton-Herve, A J ; Barge, T ; Maleville, C ; Wittkower, A</creator><creatorcontrib>Auberton-Herve, A J ; Barge, T ; Maleville, C ; Wittkower, A</creatorcontrib><description>Radio frequency (RF) microwave silicon on insulator-complementary metal oxide semiconductor (SOI-CMOS) integrated circuits has significant speed and power advantages. It reduces junction capacitance, thereby inducing a reduction of the total capacitance. It also lowers threshold voltage temperature sensitivity. SOI material is the appropriate material for advance CMOS applications.</description><identifier>ISSN: 0925-1030</identifier><identifier>DOI: 10.1023/A:1008346430921</identifier><language>eng</language><ispartof>Analog integrated circuits and signal processing, 2000-11, Vol.25 (2), p.85-91</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>315,781,785,27929,27930</link.rule.ids></links><search><creatorcontrib>Auberton-Herve, A J</creatorcontrib><creatorcontrib>Barge, T</creatorcontrib><creatorcontrib>Maleville, C</creatorcontrib><creatorcontrib>Wittkower, A</creatorcontrib><title>High volume RF/microwave SOI-CMOS integrated circuits</title><title>Analog integrated circuits and signal processing</title><description>Radio frequency (RF) microwave silicon on insulator-complementary metal oxide semiconductor (SOI-CMOS) integrated circuits has significant speed and power advantages. It reduces junction capacitance, thereby inducing a reduction of the total capacitance. It also lowers threshold voltage temperature sensitivity. SOI material is the appropriate material for advance CMOS applications.</description><issn>0925-1030</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><recordid>eNotzM9PwjAUAOAeNBGRs9eevE3e669t3sgiQoJZIngmpX3Dmo3h2uG_r4mevtvH2D3CI4KQ88UTAhRSGSWhFHjFJr_oDEHCDbuN8RMARK5gwvQqHD_4pW_Hjvjbct4FN_Tf9kJ8W6-z6rXe8nBKdBxsIs9dGNwYUrxj141tI83-nbL35fOuWmWb-mVdLTbZGQuVshxMmUtES2RKbUCAMNaqUjcGD14JdKCsLdHoBij3Bl2DVpLxvtAHiUpO2cPfex76r5Fi2nchOmpbe6J-jHuRa4VCGfkDASJFCA</recordid><startdate>20001101</startdate><enddate>20001101</enddate><creator>Auberton-Herve, A J</creator><creator>Barge, T</creator><creator>Maleville, C</creator><creator>Wittkower, A</creator><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20001101</creationdate><title>High volume RF/microwave SOI-CMOS integrated circuits</title><author>Auberton-Herve, A J ; Barge, T ; Maleville, C ; Wittkower, A</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-p184t-70697311aee695602026aa495f61bd421c04aa9165f0e7d61cf1a3e6dd85b3143</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2000</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Auberton-Herve, A J</creatorcontrib><creatorcontrib>Barge, T</creatorcontrib><creatorcontrib>Maleville, C</creatorcontrib><creatorcontrib>Wittkower, A</creatorcontrib><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Analog integrated circuits and signal processing</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Auberton-Herve, A J</au><au>Barge, T</au><au>Maleville, C</au><au>Wittkower, A</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>High volume RF/microwave SOI-CMOS integrated circuits</atitle><jtitle>Analog integrated circuits and signal processing</jtitle><date>2000-11-01</date><risdate>2000</risdate><volume>25</volume><issue>2</issue><spage>85</spage><epage>91</epage><pages>85-91</pages><issn>0925-1030</issn><abstract>Radio frequency (RF) microwave silicon on insulator-complementary metal oxide semiconductor (SOI-CMOS) integrated circuits has significant speed and power advantages. It reduces junction capacitance, thereby inducing a reduction of the total capacitance. It also lowers threshold voltage temperature sensitivity. SOI material is the appropriate material for advance CMOS applications.</abstract><doi>10.1023/A:1008346430921</doi><tpages>7</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0925-1030 |
ispartof | Analog integrated circuits and signal processing, 2000-11, Vol.25 (2), p.85-91 |
issn | 0925-1030 |
language | eng |
recordid | cdi_proquest_miscellaneous_27541246 |
source | SpringerNature Journals |
title | High volume RF/microwave SOI-CMOS integrated circuits |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-13T04%3A49%3A24IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=High%20volume%20RF/microwave%20SOI-CMOS%20integrated%20circuits&rft.jtitle=Analog%20integrated%20circuits%20and%20signal%20processing&rft.au=Auberton-Herve,%20A%20J&rft.date=2000-11-01&rft.volume=25&rft.issue=2&rft.spage=85&rft.epage=91&rft.pages=85-91&rft.issn=0925-1030&rft_id=info:doi/10.1023/A:1008346430921&rft_dat=%3Cproquest%3E27541246%3C/proquest%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=27541246&rft_id=info:pmid/&rfr_iscdi=true |