High volume RF/microwave SOI-CMOS integrated circuits
Radio frequency (RF) microwave silicon on insulator-complementary metal oxide semiconductor (SOI-CMOS) integrated circuits has significant speed and power advantages. It reduces junction capacitance, thereby inducing a reduction of the total capacitance. It also lowers threshold voltage temperature...
Gespeichert in:
Veröffentlicht in: | Analog integrated circuits and signal processing 2000-11, Vol.25 (2), p.85-91 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Radio frequency (RF) microwave silicon on insulator-complementary metal oxide semiconductor (SOI-CMOS) integrated circuits has significant speed and power advantages. It reduces junction capacitance, thereby inducing a reduction of the total capacitance. It also lowers threshold voltage temperature sensitivity. SOI material is the appropriate material for advance CMOS applications. |
---|---|
ISSN: | 0925-1030 |
DOI: | 10.1023/A:1008346430921 |