Electrochemical Deposition and Microstructure of Copper (I) Oxide Films

Cu sub 2 O films were grown on stainless steel disks by the cathodic reduction of copper(II) lactate solution. The applied potential and bath pH have strong effect on the composition and microstructure of Cu sub 2 O films. Pure Cu sub 2 O films can be made at bath pH=9 with applied potential between...

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Veröffentlicht in:Scripta materialia 1998-05, Vol.38 (11), p.1731-1738
Hauptverfasser: Zhou, Yanchun, Switzer, Jay A.
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description Cu sub 2 O films were grown on stainless steel disks by the cathodic reduction of copper(II) lactate solution. The applied potential and bath pH have strong effect on the composition and microstructure of Cu sub 2 O films. Pure Cu sub 2 O films can be made at bath pH=9 with applied potential between -0.35 and -0.55 V (vs. SCE) or at bath pH=12. The preferred orientation of the Cu sub 2 O films can be controlled by adjusting the bath pH and/or the applied potential. The crystallite shape of the Cu sub 2 O film is strongly related to the texture of Cu sub 2 O film. The crystallite shapes change from four-sided pyramids in (100) oriented film to truncated pyramids or three-sided pyramids in (111) oriented films. The grain size can be controlled simply by varying the bath pH and/or the applied potential.
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_27538212</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S1359646298000918</els_id><sourcerecordid>27538212</sourcerecordid><originalsourceid>FETCH-LOGICAL-c367t-d42367201f68e25f4bfaeed3b06bc3c84fd822c686f8b3002590fd34dc3582f83</originalsourceid><addsrcrecordid>eNqFkD1PwzAQhiMEEqXwE5AyINQOAX8krjMhVNpSqagDMFuJfRZGSRzsBMG_x2kLK9Pd8Ny9d08UXWJ0gxFmt8-YZnnCUkYmOZ8ihHKc8KNohPmMJDzN2HHof5HT6Mz79wAxTPAoWi0qkJ2z8g1qI4sqfoDWetMZ28RFo-InI531netl1zuIrY7ntm3BxZP1NN5-GQXx0lS1P49OdFF5uDjUcfS6XLzMH5PNdrWe328SSdmsS1RKQiUIa8aBZDotdQGgaIlYKankqVacEMk407ykCJEsR1rRVEmacaI5HUfX-72tsx89-E7UxkuoqqIB23tBZhnlBJMAZntwuN870KJ1pi7ct8BIDNrETpsYnIici502MQRcHQIKH3xoVzTS-L9hQgnJaR6wuz0G4dlPA054aaCRoIwLQoWy5p-gH9gZgJY</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>27538212</pqid></control><display><type>article</type><title>Electrochemical Deposition and Microstructure of Copper (I) Oxide Films</title><source>ScienceDirect Journals (5 years ago - present)</source><creator>Zhou, Yanchun ; Switzer, Jay A.</creator><creatorcontrib>Zhou, Yanchun ; Switzer, Jay A.</creatorcontrib><description>Cu sub 2 O films were grown on stainless steel disks by the cathodic reduction of copper(II) lactate solution. The applied potential and bath pH have strong effect on the composition and microstructure of Cu sub 2 O films. Pure Cu sub 2 O films can be made at bath pH=9 with applied potential between -0.35 and -0.55 V (vs. SCE) or at bath pH=12. The preferred orientation of the Cu sub 2 O films can be controlled by adjusting the bath pH and/or the applied potential. The crystallite shape of the Cu sub 2 O film is strongly related to the texture of Cu sub 2 O film. The crystallite shapes change from four-sided pyramids in (100) oriented film to truncated pyramids or three-sided pyramids in (111) oriented films. The grain size can be controlled simply by varying the bath pH and/or the applied potential.</description><identifier>ISSN: 1359-6462</identifier><identifier>EISSN: 1872-8456</identifier><identifier>DOI: 10.1016/S1359-6462(98)00091-8</identifier><language>eng</language><publisher>New York, NY: Elsevier Ltd</publisher><subject>Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids) ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Physics</subject><ispartof>Scripta materialia, 1998-05, Vol.38 (11), p.1731-1738</ispartof><rights>1998 Elsevier Science Inc.</rights><rights>1998 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c367t-d42367201f68e25f4bfaeed3b06bc3c84fd822c686f8b3002590fd34dc3582f83</citedby><cites>FETCH-LOGICAL-c367t-d42367201f68e25f4bfaeed3b06bc3c84fd822c686f8b3002590fd34dc3582f83</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/S1359-6462(98)00091-8$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3550,27924,27925,45995</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=2322939$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Zhou, Yanchun</creatorcontrib><creatorcontrib>Switzer, Jay A.</creatorcontrib><title>Electrochemical Deposition and Microstructure of Copper (I) Oxide Films</title><title>Scripta materialia</title><description>Cu sub 2 O films were grown on stainless steel disks by the cathodic reduction of copper(II) lactate solution. The applied potential and bath pH have strong effect on the composition and microstructure of Cu sub 2 O films. Pure Cu sub 2 O films can be made at bath pH=9 with applied potential between -0.35 and -0.55 V (vs. SCE) or at bath pH=12. The preferred orientation of the Cu sub 2 O films can be controlled by adjusting the bath pH and/or the applied potential. The crystallite shape of the Cu sub 2 O film is strongly related to the texture of Cu sub 2 O film. The crystallite shapes change from four-sided pyramids in (100) oriented film to truncated pyramids or three-sided pyramids in (111) oriented films. The grain size can be controlled simply by varying the bath pH and/or the applied potential.</description><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids)</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Physics</subject><issn>1359-6462</issn><issn>1872-8456</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1998</creationdate><recordtype>article</recordtype><recordid>eNqFkD1PwzAQhiMEEqXwE5AyINQOAX8krjMhVNpSqagDMFuJfRZGSRzsBMG_x2kLK9Pd8Ny9d08UXWJ0gxFmt8-YZnnCUkYmOZ8ihHKc8KNohPmMJDzN2HHof5HT6Mz79wAxTPAoWi0qkJ2z8g1qI4sqfoDWetMZ28RFo-InI531netl1zuIrY7ntm3BxZP1NN5-GQXx0lS1P49OdFF5uDjUcfS6XLzMH5PNdrWe328SSdmsS1RKQiUIa8aBZDotdQGgaIlYKankqVacEMk407ykCJEsR1rRVEmacaI5HUfX-72tsx89-E7UxkuoqqIB23tBZhnlBJMAZntwuN870KJ1pi7ct8BIDNrETpsYnIici502MQRcHQIKH3xoVzTS-L9hQgnJaR6wuz0G4dlPA054aaCRoIwLQoWy5p-gH9gZgJY</recordid><startdate>19980505</startdate><enddate>19980505</enddate><creator>Zhou, Yanchun</creator><creator>Switzer, Jay A.</creator><general>Elsevier Ltd</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>H8G</scope><scope>JG9</scope></search><sort><creationdate>19980505</creationdate><title>Electrochemical Deposition and Microstructure of Copper (I) Oxide Films</title><author>Zhou, Yanchun ; Switzer, Jay A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c367t-d42367201f68e25f4bfaeed3b06bc3c84fd822c686f8b3002590fd34dc3582f83</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1998</creationdate><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids)</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Zhou, Yanchun</creatorcontrib><creatorcontrib>Switzer, Jay A.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Copper Technical Reference Library</collection><collection>Materials Research Database</collection><jtitle>Scripta materialia</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Zhou, Yanchun</au><au>Switzer, Jay A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electrochemical Deposition and Microstructure of Copper (I) Oxide Films</atitle><jtitle>Scripta materialia</jtitle><date>1998-05-05</date><risdate>1998</risdate><volume>38</volume><issue>11</issue><spage>1731</spage><epage>1738</epage><pages>1731-1738</pages><issn>1359-6462</issn><eissn>1872-8456</eissn><abstract>Cu sub 2 O films were grown on stainless steel disks by the cathodic reduction of copper(II) lactate solution. The applied potential and bath pH have strong effect on the composition and microstructure of Cu sub 2 O films. Pure Cu sub 2 O films can be made at bath pH=9 with applied potential between -0.35 and -0.55 V (vs. SCE) or at bath pH=12. The preferred orientation of the Cu sub 2 O films can be controlled by adjusting the bath pH and/or the applied potential. The crystallite shape of the Cu sub 2 O film is strongly related to the texture of Cu sub 2 O film. The crystallite shapes change from four-sided pyramids in (100) oriented film to truncated pyramids or three-sided pyramids in (111) oriented films. The grain size can be controlled simply by varying the bath pH and/or the applied potential.</abstract><cop>New York, NY</cop><pub>Elsevier Ltd</pub><doi>10.1016/S1359-6462(98)00091-8</doi><tpages>8</tpages></addata></record>
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subjects Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Liquid phase epitaxy
deposition from liquid phases (melts, solutions, and surface layers on liquids)
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
title Electrochemical Deposition and Microstructure of Copper (I) Oxide Films
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T22%3A16%3A59IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Electrochemical%20Deposition%20and%20Microstructure%20of%20Copper%20(I)%20Oxide%20Films&rft.jtitle=Scripta%20materialia&rft.au=Zhou,%20Yanchun&rft.date=1998-05-05&rft.volume=38&rft.issue=11&rft.spage=1731&rft.epage=1738&rft.pages=1731-1738&rft.issn=1359-6462&rft.eissn=1872-8456&rft_id=info:doi/10.1016/S1359-6462(98)00091-8&rft_dat=%3Cproquest_cross%3E27538212%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=27538212&rft_id=info:pmid/&rft_els_id=S1359646298000918&rfr_iscdi=true