The effects of plasma treatment for low dielectric constant hydrogen silsesquioxane (HSQ)

Low density materials, such as hydrogen silsesquioxane (HSQ), can offer lower dielectric constants. With HSQ, a low value of K can be achieved if the density of Si-H bonding is maintained at a high level and the formation of -OH bonds and absorption or creation of water in the film is minimized. In...

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Veröffentlicht in:	Thin solid films 1998-11, Vol.332 (1-2), p.345-350
Hauptverfasser:	LIU, P. T, CHANG, T. C, HUANG, H. D, SZE, S. M, PAN, F. M, MEI, Y. J, WU, W. F, TSAI, M. S, DAI, B. T, CHANG, C. Y, SHIH, F. Y
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: electronic structure, electrical, magnetic, and optical properties Dielectric thin films Dielectrics, piezoelectrics, and ferroelectrics and their properties Exact sciences and technology Physics
Online-Zugang:	Volltext
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