Effective method for evaluation of semiconductor laser quality

The measurements of one hundred 1.3 μm planar buried crescent (PBC) structure InGaAsP/InP lasers demonstrate that parameters given by the electrical derivative of varied temperature and the variation of the parameters with temperature can be used to appraise the quality and reliability of semiconduc...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Microelectronics and reliability 2000-02, Vol.40 (2), p.333-337
Hauptverfasser: Li, Hongyan, Qi, Liyun, Shi, Jiawei, Jin, Enshun, Li, Zhengting, Gao, Dingsan, Yu, Jinzhong, Guo, Liang
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 337
container_issue 2
container_start_page 333
container_title Microelectronics and reliability
container_volume 40
creator Li, Hongyan
Qi, Liyun
Shi, Jiawei
Jin, Enshun
Li, Zhengting
Gao, Dingsan
Yu, Jinzhong
Guo, Liang
description The measurements of one hundred 1.3 μm planar buried crescent (PBC) structure InGaAsP/InP lasers demonstrate that parameters given by the electrical derivative of varied temperature and the variation of the parameters with temperature can be used to appraise the quality and reliability of semiconductor lasers effectual. By measurement of electrical derivative curves one can evaluate the quality of epitaxial wafer and chip, find the problems in the material and the technology, offer the useful information on increasing the quality and improving the technology of devices.
doi_str_mv 10.1016/S0026-2714(99)00205-X
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_27509792</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S002627149900205X</els_id><sourcerecordid>27509792</sourcerecordid><originalsourceid>FETCH-LOGICAL-c338t-7f7b4a52aeedcfdc59b073c88e78a91cdc574bccf6cb349fc97b0611720d71393</originalsourceid><addsrcrecordid>eNqFkM1LAzEQxYMoWKt_grAn0cNqkv3I5qJIqR9Q8KBCbyE7O8HI7qZNdgv9701b8eppmJn3HrwfIZeM3jLKyrt3SnmZcsHyaylv4kKLdHlEJqwSPJU5Wx6TyZ_klJyF8E0pFZSxCbmfG4Mw2A0mHQ5frkmM8wludDvqwbo-cSYJ2FlwfTPCEH-tDuiT9ahbO2zPyYnRbcCL3zkln0_zj9lLunh7fp09LlLIsmpIhRF1rguuERswDRSypiKDqkJRackgXkReA5gS6iyXBqSoacmY4LQRLJPZlFwdclferUcMg-psAGxb3aMbg-KioFJIHoXFQQjeheDRqJW3nfZbxaja0VJ7WmqHQkmp9rTUMvoeDj6MLTYWvQpgsQdsrI98VOPsPwk_Vady-A</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>27509792</pqid></control><display><type>article</type><title>Effective method for evaluation of semiconductor laser quality</title><source>ScienceDirect Journals (5 years ago - present)</source><creator>Li, Hongyan ; Qi, Liyun ; Shi, Jiawei ; Jin, Enshun ; Li, Zhengting ; Gao, Dingsan ; Yu, Jinzhong ; Guo, Liang</creator><creatorcontrib>Li, Hongyan ; Qi, Liyun ; Shi, Jiawei ; Jin, Enshun ; Li, Zhengting ; Gao, Dingsan ; Yu, Jinzhong ; Guo, Liang</creatorcontrib><description>The measurements of one hundred 1.3 μm planar buried crescent (PBC) structure InGaAsP/InP lasers demonstrate that parameters given by the electrical derivative of varied temperature and the variation of the parameters with temperature can be used to appraise the quality and reliability of semiconductor lasers effectual. By measurement of electrical derivative curves one can evaluate the quality of epitaxial wafer and chip, find the problems in the material and the technology, offer the useful information on increasing the quality and improving the technology of devices.</description><identifier>ISSN: 0026-2714</identifier><identifier>EISSN: 1872-941X</identifier><identifier>DOI: 10.1016/S0026-2714(99)00205-X</identifier><language>eng</language><publisher>Elsevier Ltd</publisher><ispartof>Microelectronics and reliability, 2000-02, Vol.40 (2), p.333-337</ispartof><rights>2000 Elsevier Science Ltd</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c338t-7f7b4a52aeedcfdc59b073c88e78a91cdc574bccf6cb349fc97b0611720d71393</citedby><cites>FETCH-LOGICAL-c338t-7f7b4a52aeedcfdc59b073c88e78a91cdc574bccf6cb349fc97b0611720d71393</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/S0026-2714(99)00205-X$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3550,27924,27925,45995</link.rule.ids></links><search><creatorcontrib>Li, Hongyan</creatorcontrib><creatorcontrib>Qi, Liyun</creatorcontrib><creatorcontrib>Shi, Jiawei</creatorcontrib><creatorcontrib>Jin, Enshun</creatorcontrib><creatorcontrib>Li, Zhengting</creatorcontrib><creatorcontrib>Gao, Dingsan</creatorcontrib><creatorcontrib>Yu, Jinzhong</creatorcontrib><creatorcontrib>Guo, Liang</creatorcontrib><title>Effective method for evaluation of semiconductor laser quality</title><title>Microelectronics and reliability</title><description>The measurements of one hundred 1.3 μm planar buried crescent (PBC) structure InGaAsP/InP lasers demonstrate that parameters given by the electrical derivative of varied temperature and the variation of the parameters with temperature can be used to appraise the quality and reliability of semiconductor lasers effectual. By measurement of electrical derivative curves one can evaluate the quality of epitaxial wafer and chip, find the problems in the material and the technology, offer the useful information on increasing the quality and improving the technology of devices.</description><issn>0026-2714</issn><issn>1872-941X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><recordid>eNqFkM1LAzEQxYMoWKt_grAn0cNqkv3I5qJIqR9Q8KBCbyE7O8HI7qZNdgv9701b8eppmJn3HrwfIZeM3jLKyrt3SnmZcsHyaylv4kKLdHlEJqwSPJU5Wx6TyZ_klJyF8E0pFZSxCbmfG4Mw2A0mHQ5frkmM8wludDvqwbo-cSYJ2FlwfTPCEH-tDuiT9ahbO2zPyYnRbcCL3zkln0_zj9lLunh7fp09LlLIsmpIhRF1rguuERswDRSypiKDqkJRackgXkReA5gS6iyXBqSoacmY4LQRLJPZlFwdclferUcMg-psAGxb3aMbg-KioFJIHoXFQQjeheDRqJW3nfZbxaja0VJ7WmqHQkmp9rTUMvoeDj6MLTYWvQpgsQdsrI98VOPsPwk_Vady-A</recordid><startdate>20000201</startdate><enddate>20000201</enddate><creator>Li, Hongyan</creator><creator>Qi, Liyun</creator><creator>Shi, Jiawei</creator><creator>Jin, Enshun</creator><creator>Li, Zhengting</creator><creator>Gao, Dingsan</creator><creator>Yu, Jinzhong</creator><creator>Guo, Liang</creator><general>Elsevier Ltd</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20000201</creationdate><title>Effective method for evaluation of semiconductor laser quality</title><author>Li, Hongyan ; Qi, Liyun ; Shi, Jiawei ; Jin, Enshun ; Li, Zhengting ; Gao, Dingsan ; Yu, Jinzhong ; Guo, Liang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c338t-7f7b4a52aeedcfdc59b073c88e78a91cdc574bccf6cb349fc97b0611720d71393</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2000</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Li, Hongyan</creatorcontrib><creatorcontrib>Qi, Liyun</creatorcontrib><creatorcontrib>Shi, Jiawei</creatorcontrib><creatorcontrib>Jin, Enshun</creatorcontrib><creatorcontrib>Li, Zhengting</creatorcontrib><creatorcontrib>Gao, Dingsan</creatorcontrib><creatorcontrib>Yu, Jinzhong</creatorcontrib><creatorcontrib>Guo, Liang</creatorcontrib><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Microelectronics and reliability</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Li, Hongyan</au><au>Qi, Liyun</au><au>Shi, Jiawei</au><au>Jin, Enshun</au><au>Li, Zhengting</au><au>Gao, Dingsan</au><au>Yu, Jinzhong</au><au>Guo, Liang</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effective method for evaluation of semiconductor laser quality</atitle><jtitle>Microelectronics and reliability</jtitle><date>2000-02-01</date><risdate>2000</risdate><volume>40</volume><issue>2</issue><spage>333</spage><epage>337</epage><pages>333-337</pages><issn>0026-2714</issn><eissn>1872-941X</eissn><abstract>The measurements of one hundred 1.3 μm planar buried crescent (PBC) structure InGaAsP/InP lasers demonstrate that parameters given by the electrical derivative of varied temperature and the variation of the parameters with temperature can be used to appraise the quality and reliability of semiconductor lasers effectual. By measurement of electrical derivative curves one can evaluate the quality of epitaxial wafer and chip, find the problems in the material and the technology, offer the useful information on increasing the quality and improving the technology of devices.</abstract><pub>Elsevier Ltd</pub><doi>10.1016/S0026-2714(99)00205-X</doi><tpages>5</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0026-2714
ispartof Microelectronics and reliability, 2000-02, Vol.40 (2), p.333-337
issn 0026-2714
1872-941X
language eng
recordid cdi_proquest_miscellaneous_27509792
source ScienceDirect Journals (5 years ago - present)
title Effective method for evaluation of semiconductor laser quality
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-08T04%3A47%3A59IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Effective%20method%20for%20evaluation%20of%20semiconductor%20laser%20quality&rft.jtitle=Microelectronics%20and%20reliability&rft.au=Li,%20Hongyan&rft.date=2000-02-01&rft.volume=40&rft.issue=2&rft.spage=333&rft.epage=337&rft.pages=333-337&rft.issn=0026-2714&rft.eissn=1872-941X&rft_id=info:doi/10.1016/S0026-2714(99)00205-X&rft_dat=%3Cproquest_cross%3E27509792%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=27509792&rft_id=info:pmid/&rft_els_id=S002627149900205X&rfr_iscdi=true