Deposition Rate of Ni Thin Films by Modified r.f. Magnetron Sputtering

In order to obtain high deposition rate of Ni films, we have developed a modified magnetron sputtering cathode configuration with a ferromagnetic Ni target of 100 mm in diameter and 5 mm in thickness. The plasma confinement could be enhanced by providing four special permanent magnets around outside...

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Veröffentlicht in:	SHINKU 2000, Vol.43 (3), p.311-313
Hauptverfasser:	HARADA, Takeshi, ASAHARA, Hiroshi, KAWAMURA, Tomohiko, SATO, Yutaka, SHIMAMOTO, Syogo, TANAKA, Takeshi, KAWABATA, Keishi
Format:	Artikel
Sprache:	eng ; jpn
Online-Zugang:	Volltext
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