Magnetron sputter deposition of A-15 and BCC crystal structure tungsten thin films

The effect of processing parameters on the crystal structure and electrical resistivity of magnetron sputter deposited W thin films was investigated. Formation of body centered cubic (bcc) W was favored when the concentration of impurity oxygen atoms in the films was < 5 at.% while the formation...

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Veröffentlicht in:	Journal of electronic materials 1995-08, Vol.24 (8), p.961-967
Hauptverfasser:	O'KEEFE, M. J, GRANT, J. T, SOLOMON, J. S
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Electrical properties of specific thin films Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Exact sciences and technology Materials science Metal and metallic alloys Metals and metallic alloys Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Physics Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
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