Velocity overshoot of electrons and holes in Si inversion layers

Velocity overshoot of inversion layer electrons and holes is studied experimentally and analytically in special test structures with nominally uniform electric field. The data were used to calibrate energy relaxation parameters in a commercial simulator MEDICI ver. 2.0. We propose an analytical mode...

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Veröffentlicht in:Solid-state electronics 1997, Vol.41 (8), p.1119-1125
Hauptverfasser: Sinitsky, D, Assaderaghi, F, Orshansky, M, Bokor, J, Hu, C
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container_end_page 1125
container_issue 8
container_start_page 1119
container_title Solid-state electronics
container_volume 41
creator Sinitsky, D
Assaderaghi, F
Orshansky, M
Bokor, J
Hu, C
description Velocity overshoot of inversion layer electrons and holes is studied experimentally and analytically in special test structures with nominally uniform electric field. The data were used to calibrate energy relaxation parameters in a commercial simulator MEDICI ver. 2.0. We propose an analytical model for velocity overshoot and show that it agrees well with experimental data. The amount of hole velocity overshoot is small.
doi_str_mv 10.1016/S0038-1101(97)00031-2
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title Velocity overshoot of electrons and holes in Si inversion layers
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