Electrodeposition of Ni-W-B amorphous alloys
Partial polarization curves at the glassy carbon rotating disc electrode have been used to study the electodeposition of Ni and Ni-W alloy from citrate-containing solution. For deposition of Ni-W alloys, the partial polarization curves indicate diffusion control for nickel reduction and stoichiometr...
Gespeichert in:
Veröffentlicht in: | Journal of applied electrochemistry 1995-12, Vol.25 (12), p.1091-1097 |
---|---|
Hauptverfasser: | , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 1097 |
---|---|
container_issue | 12 |
container_start_page | 1091 |
container_title | Journal of applied electrochemistry |
container_volume | 25 |
creator | ISAEV, N OSTERYOUNG, J. G |
description | Partial polarization curves at the glassy carbon rotating disc electrode have been used to study the electodeposition of Ni and Ni-W alloy from citrate-containing solution. For deposition of Ni-W alloys, the partial polarization curves indicate diffusion control for nickel reduction and stoichiometric limitation for tungsten deposition by the composition of the alloy. Plating experiments show that current efficency of the electrodeposition and composition of the resulting alloy depend on the parameters of the electrolysis. The best conditions for electrodeposition of the alloy Ni-W-B are current density of 45-50 mA cm exp -2 , temperature of 60-70 deg C, Ni(II) concentration of 20-25 mM, and pH 8.5. Pulsed galvenostatic plating at 1 Hz increased slighly the current effciency. The concentration of Ni(II) in the solution can be self-regulated by using a Ni bipolar electrode in the cathode compartment. |
doi_str_mv | 10.1007/BF00242535 |
format | Article |
fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_27406289</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>27406289</sourcerecordid><originalsourceid>FETCH-LOGICAL-c325t-19317045080a3fe9671f1420e7843006df83e59593d29a234e102c17b6212e873</originalsourceid><addsrcrecordid>eNpFkEFLAzEUhIMoWKsXf8EexIMYfXlJNsnRllaFohdFb0tME1xJmzXZHvrvXWnR08DjezPDEHLO4IYBqNvJHAAFSi4PyIhJhVRrrg_JaDgzqg17PyYnpXwBgMFajMj1LHrX57T0XSpt36Z1lUL11NI3OqnsKuXuM21KZWNM23JKjoKNxZ_tdUxe57OX6QNdPN8_Tu8W1HGUPWWGMwVCggbLgze1YoEJBK-04AD1MmjupZGGL9FY5MIzQMfUR40MvVZ8TC53vl1O3xtf-mbVFudjtGs_tGlQCahRmwG82oEup1KyD02X25XN24ZB8ztI8z_IAF_sXW1xNoZs164tfx849ORD-A86MFvi</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>27406289</pqid></control><display><type>article</type><title>Electrodeposition of Ni-W-B amorphous alloys</title><source>SpringerLink Journals - AutoHoldings</source><creator>ISAEV, N ; OSTERYOUNG, J. G</creator><creatorcontrib>ISAEV, N ; OSTERYOUNG, J. G</creatorcontrib><description>Partial polarization curves at the glassy carbon rotating disc electrode have been used to study the electodeposition of Ni and Ni-W alloy from citrate-containing solution. For deposition of Ni-W alloys, the partial polarization curves indicate diffusion control for nickel reduction and stoichiometric limitation for tungsten deposition by the composition of the alloy. Plating experiments show that current efficency of the electrodeposition and composition of the resulting alloy depend on the parameters of the electrolysis. The best conditions for electrodeposition of the alloy Ni-W-B are current density of 45-50 mA cm exp -2 , temperature of 60-70 deg C, Ni(II) concentration of 20-25 mM, and pH 8.5. Pulsed galvenostatic plating at 1 Hz increased slighly the current effciency. The concentration of Ni(II) in the solution can be self-regulated by using a Ni bipolar electrode in the cathode compartment.</description><identifier>ISSN: 0021-891X</identifier><identifier>EISSN: 1572-8838</identifier><identifier>DOI: 10.1007/BF00242535</identifier><identifier>CODEN: JAELBJ</identifier><language>eng</language><publisher>Heidelberg: Springer</publisher><subject>Chemistry ; Electrochemistry ; Electrodeposition ; Exact sciences and technology ; General and physical chemistry ; Study of interfaces</subject><ispartof>Journal of applied electrochemistry, 1995-12, Vol.25 (12), p.1091-1097</ispartof><rights>1996 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c325t-19317045080a3fe9671f1420e7843006df83e59593d29a234e102c17b6212e873</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=2967387$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>ISAEV, N</creatorcontrib><creatorcontrib>OSTERYOUNG, J. G</creatorcontrib><title>Electrodeposition of Ni-W-B amorphous alloys</title><title>Journal of applied electrochemistry</title><description>Partial polarization curves at the glassy carbon rotating disc electrode have been used to study the electodeposition of Ni and Ni-W alloy from citrate-containing solution. For deposition of Ni-W alloys, the partial polarization curves indicate diffusion control for nickel reduction and stoichiometric limitation for tungsten deposition by the composition of the alloy. Plating experiments show that current efficency of the electrodeposition and composition of the resulting alloy depend on the parameters of the electrolysis. The best conditions for electrodeposition of the alloy Ni-W-B are current density of 45-50 mA cm exp -2 , temperature of 60-70 deg C, Ni(II) concentration of 20-25 mM, and pH 8.5. Pulsed galvenostatic plating at 1 Hz increased slighly the current effciency. The concentration of Ni(II) in the solution can be self-regulated by using a Ni bipolar electrode in the cathode compartment.</description><subject>Chemistry</subject><subject>Electrochemistry</subject><subject>Electrodeposition</subject><subject>Exact sciences and technology</subject><subject>General and physical chemistry</subject><subject>Study of interfaces</subject><issn>0021-891X</issn><issn>1572-8838</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1995</creationdate><recordtype>article</recordtype><recordid>eNpFkEFLAzEUhIMoWKsXf8EexIMYfXlJNsnRllaFohdFb0tME1xJmzXZHvrvXWnR08DjezPDEHLO4IYBqNvJHAAFSi4PyIhJhVRrrg_JaDgzqg17PyYnpXwBgMFajMj1LHrX57T0XSpt36Z1lUL11NI3OqnsKuXuM21KZWNM23JKjoKNxZ_tdUxe57OX6QNdPN8_Tu8W1HGUPWWGMwVCggbLgze1YoEJBK-04AD1MmjupZGGL9FY5MIzQMfUR40MvVZ8TC53vl1O3xtf-mbVFudjtGs_tGlQCahRmwG82oEup1KyD02X25XN24ZB8ztI8z_IAF_sXW1xNoZs164tfx849ORD-A86MFvi</recordid><startdate>19951201</startdate><enddate>19951201</enddate><creator>ISAEV, N</creator><creator>OSTERYOUNG, J. G</creator><general>Springer</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>19951201</creationdate><title>Electrodeposition of Ni-W-B amorphous alloys</title><author>ISAEV, N ; OSTERYOUNG, J. G</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c325t-19317045080a3fe9671f1420e7843006df83e59593d29a234e102c17b6212e873</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1995</creationdate><topic>Chemistry</topic><topic>Electrochemistry</topic><topic>Electrodeposition</topic><topic>Exact sciences and technology</topic><topic>General and physical chemistry</topic><topic>Study of interfaces</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>ISAEV, N</creatorcontrib><creatorcontrib>OSTERYOUNG, J. G</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of applied electrochemistry</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>ISAEV, N</au><au>OSTERYOUNG, J. G</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electrodeposition of Ni-W-B amorphous alloys</atitle><jtitle>Journal of applied electrochemistry</jtitle><date>1995-12-01</date><risdate>1995</risdate><volume>25</volume><issue>12</issue><spage>1091</spage><epage>1097</epage><pages>1091-1097</pages><issn>0021-891X</issn><eissn>1572-8838</eissn><coden>JAELBJ</coden><abstract>Partial polarization curves at the glassy carbon rotating disc electrode have been used to study the electodeposition of Ni and Ni-W alloy from citrate-containing solution. For deposition of Ni-W alloys, the partial polarization curves indicate diffusion control for nickel reduction and stoichiometric limitation for tungsten deposition by the composition of the alloy. Plating experiments show that current efficency of the electrodeposition and composition of the resulting alloy depend on the parameters of the electrolysis. The best conditions for electrodeposition of the alloy Ni-W-B are current density of 45-50 mA cm exp -2 , temperature of 60-70 deg C, Ni(II) concentration of 20-25 mM, and pH 8.5. Pulsed galvenostatic plating at 1 Hz increased slighly the current effciency. The concentration of Ni(II) in the solution can be self-regulated by using a Ni bipolar electrode in the cathode compartment.</abstract><cop>Heidelberg</cop><pub>Springer</pub><doi>10.1007/BF00242535</doi><tpages>7</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0021-891X |
ispartof | Journal of applied electrochemistry, 1995-12, Vol.25 (12), p.1091-1097 |
issn | 0021-891X 1572-8838 |
language | eng |
recordid | cdi_proquest_miscellaneous_27406289 |
source | SpringerLink Journals - AutoHoldings |
subjects | Chemistry Electrochemistry Electrodeposition Exact sciences and technology General and physical chemistry Study of interfaces |
title | Electrodeposition of Ni-W-B amorphous alloys |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-04T10%3A01%3A57IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Electrodeposition%20of%20Ni-W-B%20amorphous%20alloys&rft.jtitle=Journal%20of%20applied%20electrochemistry&rft.au=ISAEV,%20N&rft.date=1995-12-01&rft.volume=25&rft.issue=12&rft.spage=1091&rft.epage=1097&rft.pages=1091-1097&rft.issn=0021-891X&rft.eissn=1572-8838&rft.coden=JAELBJ&rft_id=info:doi/10.1007/BF00242535&rft_dat=%3Cproquest_cross%3E27406289%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=27406289&rft_id=info:pmid/&rfr_iscdi=true |