Control composition study of sputtered NiTi shape memory alloy film
Since the transition temperature of the shape memory effect in Ni x Ti 1− x films depends on the composition of the layer, it is indispensable to have an accurate control on their composition. We are now able to control in situ the composition of r.f. sputtered NiTi films in the whole domain of sha...
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| Veröffentlicht in: | Materials science & engineering. B, Solid-state materials for advanced technology Solid-state materials for advanced technology, 1995-11, Vol.34 (2), p.112-115 |
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| container_title | Materials science & engineering. B, Solid-state materials for advanced technology |
| container_volume | 34 |
| creator | Bendahan, Marc Canet, Pierre Seguin, Jean-Luc Carchano, Hervé |
| description | Since the transition temperature of the shape memory effect in Ni
x
Ti
1−
x
films depends on the composition of the layer, it is indispensable to have an accurate control on their composition. We are now able to control in situ the composition of r.f. sputtered NiTi films in the whole domain of shape memory effect (0.476 <
x < 0.531), by varying the product of sputtering gas pressure
P and target-to-substrate distance
d. Pressure measurements are found to give a good sensitivity for the control of Ti-rich layers, while the optical emission spectroscopy of the sputtering plasma gives better sensitivity for Ni-rich layers. |
| doi_str_mv | 10.1016/0921-5107(95)01237-0 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_27335099</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>0921510795012370</els_id><sourcerecordid>27335099</sourcerecordid><originalsourceid>FETCH-LOGICAL-c296t-3a47c58c6d635b37d194962bd3a2d9be277b8c9de1cfd1470067131a79d40cfc3</originalsourceid><addsrcrecordid>eNp9kM1KAzEUhYMoWKtv4CILEV2M5m8mzUaQYlUouqnrkCYZjGQmY5IR5kl8FZ_KZ3Bqi0tXd_Odc7gfAKcYXWGEq2skCC5KjPiFKC8RJpQXaA9M8IzTggnG9sHkDzkERym9ITRihEzAYh7aHIOHOjRdSC670MKUezPAUMPU9TnbaA18ct-fXysH06vqLGxsE-IAlfdhgLXzzTE4qJVP9mR3p-BlcbeaPxTL5_vH-e2y0ERUuaCKcV3OdGUqWq4pN1gwUZG1oYoYsbaE8_VMC2Oxrg1mHKGKY4oVF4YhXWs6Befb3i6G996mLBuXtPVetTb0SRJOaYmEGEG2BXUMKUVbyy66RsVBYiQ30uTGiNwYkaKUv9IkGmNnu36VtPJ1VK126S9LBEaCshG72WJ2_PXD2SiTdrbV1rhodZYmuP93fgAUV4EU</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>27335099</pqid></control><display><type>article</type><title>Control composition study of sputtered NiTi shape memory alloy film</title><source>ScienceDirect Journals (5 years ago - present)</source><creator>Bendahan, Marc ; Canet, Pierre ; Seguin, Jean-Luc ; Carchano, Hervé</creator><creatorcontrib>Bendahan, Marc ; Canet, Pierre ; Seguin, Jean-Luc ; Carchano, Hervé</creatorcontrib><description>Since the transition temperature of the shape memory effect in Ni
x
Ti
1−
x
films depends on the composition of the layer, it is indispensable to have an accurate control on their composition. We are now able to control in situ the composition of r.f. sputtered NiTi films in the whole domain of shape memory effect (0.476 <
x < 0.531), by varying the product of sputtering gas pressure
P and target-to-substrate distance
d. Pressure measurements are found to give a good sensitivity for the control of Ti-rich layers, while the optical emission spectroscopy of the sputtering plasma gives better sensitivity for Ni-rich layers.</description><identifier>ISSN: 0921-5107</identifier><identifier>EISSN: 1873-4944</identifier><identifier>DOI: 10.1016/0921-5107(95)01237-0</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Applied sciences ; Condensed matter: structure, mechanical and thermal properties ; Deformation and plasticity (including yield, ductility, and superplasticity) ; Exact sciences and technology ; Mechanical and acoustical properties of condensed matter ; Mechanical properties of solids ; Metals. Metallurgy ; NiTi ; Physics ; Shape memory alloy ; Sputtering ; Thin film</subject><ispartof>Materials science & engineering. B, Solid-state materials for advanced technology, 1995-11, Vol.34 (2), p.112-115</ispartof><rights>1995</rights><rights>1996 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c296t-3a47c58c6d635b37d194962bd3a2d9be277b8c9de1cfd1470067131a79d40cfc3</citedby><cites>FETCH-LOGICAL-c296t-3a47c58c6d635b37d194962bd3a2d9be277b8c9de1cfd1470067131a79d40cfc3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/0921-5107(95)01237-0$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,777,781,3537,27905,27906,45976</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=2910934$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Bendahan, Marc</creatorcontrib><creatorcontrib>Canet, Pierre</creatorcontrib><creatorcontrib>Seguin, Jean-Luc</creatorcontrib><creatorcontrib>Carchano, Hervé</creatorcontrib><title>Control composition study of sputtered NiTi shape memory alloy film</title><title>Materials science & engineering. B, Solid-state materials for advanced technology</title><description>Since the transition temperature of the shape memory effect in Ni
x
Ti
1−
x
films depends on the composition of the layer, it is indispensable to have an accurate control on their composition. We are now able to control in situ the composition of r.f. sputtered NiTi films in the whole domain of shape memory effect (0.476 <
x < 0.531), by varying the product of sputtering gas pressure
P and target-to-substrate distance
d. Pressure measurements are found to give a good sensitivity for the control of Ti-rich layers, while the optical emission spectroscopy of the sputtering plasma gives better sensitivity for Ni-rich layers.</description><subject>Applied sciences</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Deformation and plasticity (including yield, ductility, and superplasticity)</subject><subject>Exact sciences and technology</subject><subject>Mechanical and acoustical properties of condensed matter</subject><subject>Mechanical properties of solids</subject><subject>Metals. Metallurgy</subject><subject>NiTi</subject><subject>Physics</subject><subject>Shape memory alloy</subject><subject>Sputtering</subject><subject>Thin film</subject><issn>0921-5107</issn><issn>1873-4944</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1995</creationdate><recordtype>article</recordtype><recordid>eNp9kM1KAzEUhYMoWKtv4CILEV2M5m8mzUaQYlUouqnrkCYZjGQmY5IR5kl8FZ_KZ3Bqi0tXd_Odc7gfAKcYXWGEq2skCC5KjPiFKC8RJpQXaA9M8IzTggnG9sHkDzkERym9ITRihEzAYh7aHIOHOjRdSC670MKUezPAUMPU9TnbaA18ct-fXysH06vqLGxsE-IAlfdhgLXzzTE4qJVP9mR3p-BlcbeaPxTL5_vH-e2y0ERUuaCKcV3OdGUqWq4pN1gwUZG1oYoYsbaE8_VMC2Oxrg1mHKGKY4oVF4YhXWs6Befb3i6G996mLBuXtPVetTb0SRJOaYmEGEG2BXUMKUVbyy66RsVBYiQ30uTGiNwYkaKUv9IkGmNnu36VtPJ1VK126S9LBEaCshG72WJ2_PXD2SiTdrbV1rhodZYmuP93fgAUV4EU</recordid><startdate>19951101</startdate><enddate>19951101</enddate><creator>Bendahan, Marc</creator><creator>Canet, Pierre</creator><creator>Seguin, Jean-Luc</creator><creator>Carchano, Hervé</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>19951101</creationdate><title>Control composition study of sputtered NiTi shape memory alloy film</title><author>Bendahan, Marc ; Canet, Pierre ; Seguin, Jean-Luc ; Carchano, Hervé</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c296t-3a47c58c6d635b37d194962bd3a2d9be277b8c9de1cfd1470067131a79d40cfc3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1995</creationdate><topic>Applied sciences</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Deformation and plasticity (including yield, ductility, and superplasticity)</topic><topic>Exact sciences and technology</topic><topic>Mechanical and acoustical properties of condensed matter</topic><topic>Mechanical properties of solids</topic><topic>Metals. Metallurgy</topic><topic>NiTi</topic><topic>Physics</topic><topic>Shape memory alloy</topic><topic>Sputtering</topic><topic>Thin film</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Bendahan, Marc</creatorcontrib><creatorcontrib>Canet, Pierre</creatorcontrib><creatorcontrib>Seguin, Jean-Luc</creatorcontrib><creatorcontrib>Carchano, Hervé</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Materials science & engineering. B, Solid-state materials for advanced technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Bendahan, Marc</au><au>Canet, Pierre</au><au>Seguin, Jean-Luc</au><au>Carchano, Hervé</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Control composition study of sputtered NiTi shape memory alloy film</atitle><jtitle>Materials science & engineering. B, Solid-state materials for advanced technology</jtitle><date>1995-11-01</date><risdate>1995</risdate><volume>34</volume><issue>2</issue><spage>112</spage><epage>115</epage><pages>112-115</pages><issn>0921-5107</issn><eissn>1873-4944</eissn><abstract>Since the transition temperature of the shape memory effect in Ni
x
Ti
1−
x
films depends on the composition of the layer, it is indispensable to have an accurate control on their composition. We are now able to control in situ the composition of r.f. sputtered NiTi films in the whole domain of shape memory effect (0.476 <
x < 0.531), by varying the product of sputtering gas pressure
P and target-to-substrate distance
d. Pressure measurements are found to give a good sensitivity for the control of Ti-rich layers, while the optical emission spectroscopy of the sputtering plasma gives better sensitivity for Ni-rich layers.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/0921-5107(95)01237-0</doi><tpages>4</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0921-5107 |
| ispartof | Materials science & engineering. B, Solid-state materials for advanced technology, 1995-11, Vol.34 (2), p.112-115 |
| issn | 0921-5107 1873-4944 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_27335099 |
| source | ScienceDirect Journals (5 years ago - present) |
| subjects | Applied sciences Condensed matter: structure, mechanical and thermal properties Deformation and plasticity (including yield, ductility, and superplasticity) Exact sciences and technology Mechanical and acoustical properties of condensed matter Mechanical properties of solids Metals. Metallurgy NiTi Physics Shape memory alloy Sputtering Thin film |
| title | Control composition study of sputtered NiTi shape memory alloy film |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-18T16%3A12%3A29IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Control%20composition%20study%20of%20sputtered%20Ni%EE%97%B8Ti%20shape%20memory%20alloy%20film&rft.jtitle=Materials%20science%20&%20engineering.%20B,%20Solid-state%20materials%20for%20advanced%20technology&rft.au=Bendahan,%20Marc&rft.date=1995-11-01&rft.volume=34&rft.issue=2&rft.spage=112&rft.epage=115&rft.pages=112-115&rft.issn=0921-5107&rft.eissn=1873-4944&rft_id=info:doi/10.1016/0921-5107(95)01237-0&rft_dat=%3Cproquest_cross%3E27335099%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=27335099&rft_id=info:pmid/&rft_els_id=0921510795012370&rfr_iscdi=true |