Comparative film thickness determination by atomic force microscopy and ellipsometry for ultrathin polymer films

Ellipsometry and atomic force microscopy (AFM) were used to study the film thickness of continuous and discontinuous polymer films in the 1–20 nm thickness range on smooth silicon wafers and on structured aluminium substrates. The methods of exploiting AFM for thickness measurements with a high spat...

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Veröffentlicht in:Surface and interface analysis 1995-11, Vol.23 (12), p.797-808
Hauptverfasser: Gesang, T., Fanter, D., Höper, R., Possart, W., Hennemann, O.-D.
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Sprache:eng
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