TEM investigation of CVD graphite on nickel

Graphite films have been deposited by chemical vapour deposition from C 2H 4 at 1170 K on polycrystalline Ni substrates. The graphite films were characterized with respect to surface morphology and microstructure. The interface between the deposited graphite and the Ni grains was investigated by tra...

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Veröffentlicht in:	Thin solid films 1994-11, Vol.252 (1), p.19-25
Hauptverfasser:	Johansson, Ann-Sofie, Lu, Jun, Carlsson, Jan-Otto
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapour deposition Graphite Nickel Transmission electron microscopy
Online-Zugang:	Volltext
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