TEM investigation of CVD graphite on nickel

TEM investigation of CVD graphite on nickel

Graphite films have been deposited by chemical vapour deposition from C 2H 4 at 1170 K on polycrystalline Ni substrates. The graphite films were characterized with respect to surface morphology and microstructure. The interface between the deposited graphite and the Ni grains was investigated by tra...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Thin solid films 1994-11, Vol.252 (1), p.19-25
Hauptverfasser: Johansson, Ann-Sofie, Lu, Jun, Carlsson, Jan-Otto
Format: Artikel
Sprache:eng
Schlagworte:
Chemical vapour deposition
Graphite
Nickel
Transmission electron microscopy
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 25
container_issue 1
container_start_page 19
container_title Thin solid films
container_volume 252
creator Johansson, Ann-Sofie
Lu, Jun
Carlsson, Jan-Otto
description Graphite films have been deposited by chemical vapour deposition from C 2H 4 at 1170 K on polycrystalline Ni substrates. The graphite films were characterized with respect to surface morphology and microstructure. The interface between the deposited graphite and the Ni grains was investigated by transmission electron microscopy. A smooth interface between the graphite and the Ni was observed. Electron diffraction was used to determine orientation relationships between the graphite and the Ni grains. Four different Ni grain orientations were found and for all four the graphite layers grow parallel to the Ni grain surface. A nucleation and growth mechanism involving hydrogen abstraction reactions and formation of polycyclic hydrocarbons has been proposed.
doi_str_mv 10.1016/0040-6090(94)90819-2
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_27293157</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>0040609094908192</els_id><sourcerecordid>27293157</sourcerecordid><originalsourceid>FETCH-LOGICAL-c335t-99900b512d2800e55343de365e550151469de44134af2cc7648a4d448a680f4c3</originalsourceid><addsrcrecordid>eNp9UMtOwzAQtBBIhMIfcMgJgVBg_UriCxIK5SEVcSlcLeNsiiFNip1W4u9xCeLIZXe0mhntDCHHFC4o0PwSQECWg4JTJc4UlFRlbIcktCwiKDjdJckfZZ8chPAOAJQxnpDz-fQxdd0Gw-AWZnB9l_ZNWr3cpAtvVm9uwDSeOmc_sD0ke41pAx797gl5vp3Oq_ts9nT3UF3PMsu5HDKlFMCrpKxmJQBKyQWvkecyQqCSilzVKATlwjTM2iIXpRG1iDMvoRGWT8jJ6Lvy_ec6fqaXLlhsW9Nhvw6aFUxxKotIFCPR-j4Ej41eebc0_ktT0Ntm9Da23sbWSuifZjSLsqtRhjHExqHXwTrsLNbOox103bv_Db4BdV5m6Q</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>27293157</pqid></control><display><type>article</type><title>TEM investigation of CVD graphite on nickel</title><source>Elsevier ScienceDirect Journals</source><creator>Johansson, Ann-Sofie ; Lu, Jun ; Carlsson, Jan-Otto</creator><creatorcontrib>Johansson, Ann-Sofie ; Lu, Jun ; Carlsson, Jan-Otto</creatorcontrib><description>Graphite films have been deposited by chemical vapour deposition from C 2H 4 at 1170 K on polycrystalline Ni substrates. The graphite films were characterized with respect to surface morphology and microstructure. The interface between the deposited graphite and the Ni grains was investigated by transmission electron microscopy. A smooth interface between the graphite and the Ni was observed. Electron diffraction was used to determine orientation relationships between the graphite and the Ni grains. Four different Ni grain orientations were found and for all four the graphite layers grow parallel to the Ni grain surface. A nucleation and growth mechanism involving hydrogen abstraction reactions and formation of polycyclic hydrocarbons has been proposed.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/0040-6090(94)90819-2</identifier><language>eng</language><publisher>Elsevier B.V</publisher><subject>Chemical vapour deposition ; Graphite ; Nickel ; Transmission electron microscopy</subject><ispartof>Thin solid films, 1994-11, Vol.252 (1), p.19-25</ispartof><rights>1994</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c335t-99900b512d2800e55343de365e550151469de44134af2cc7648a4d448a680f4c3</citedby><cites>FETCH-LOGICAL-c335t-99900b512d2800e55343de365e550151469de44134af2cc7648a4d448a680f4c3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/0040609094908192$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,776,780,3537,27901,27902,65306</link.rule.ids></links><search><creatorcontrib>Johansson, Ann-Sofie</creatorcontrib><creatorcontrib>Lu, Jun</creatorcontrib><creatorcontrib>Carlsson, Jan-Otto</creatorcontrib><title>TEM investigation of CVD graphite on nickel</title><title>Thin solid films</title><description>Graphite films have been deposited by chemical vapour deposition from C 2H 4 at 1170 K on polycrystalline Ni substrates. The graphite films were characterized with respect to surface morphology and microstructure. The interface between the deposited graphite and the Ni grains was investigated by transmission electron microscopy. A smooth interface between the graphite and the Ni was observed. Electron diffraction was used to determine orientation relationships between the graphite and the Ni grains. Four different Ni grain orientations were found and for all four the graphite layers grow parallel to the Ni grain surface. A nucleation and growth mechanism involving hydrogen abstraction reactions and formation of polycyclic hydrocarbons has been proposed.</description><subject>Chemical vapour deposition</subject><subject>Graphite</subject><subject>Nickel</subject><subject>Transmission electron microscopy</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1994</creationdate><recordtype>article</recordtype><recordid>eNp9UMtOwzAQtBBIhMIfcMgJgVBg_UriCxIK5SEVcSlcLeNsiiFNip1W4u9xCeLIZXe0mhntDCHHFC4o0PwSQECWg4JTJc4UlFRlbIcktCwiKDjdJckfZZ8chPAOAJQxnpDz-fQxdd0Gw-AWZnB9l_ZNWr3cpAtvVm9uwDSeOmc_sD0ke41pAx797gl5vp3Oq_ts9nT3UF3PMsu5HDKlFMCrpKxmJQBKyQWvkecyQqCSilzVKATlwjTM2iIXpRG1iDMvoRGWT8jJ6Lvy_ec6fqaXLlhsW9Nhvw6aFUxxKotIFCPR-j4Ej41eebc0_ktT0Ntm9Da23sbWSuifZjSLsqtRhjHExqHXwTrsLNbOox103bv_Db4BdV5m6Q</recordid><startdate>19941115</startdate><enddate>19941115</enddate><creator>Johansson, Ann-Sofie</creator><creator>Lu, Jun</creator><creator>Carlsson, Jan-Otto</creator><general>Elsevier B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>19941115</creationdate><title>TEM investigation of CVD graphite on nickel</title><author>Johansson, Ann-Sofie ; Lu, Jun ; Carlsson, Jan-Otto</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c335t-99900b512d2800e55343de365e550151469de44134af2cc7648a4d448a680f4c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1994</creationdate><topic>Chemical vapour deposition</topic><topic>Graphite</topic><topic>Nickel</topic><topic>Transmission electron microscopy</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Johansson, Ann-Sofie</creatorcontrib><creatorcontrib>Lu, Jun</creatorcontrib><creatorcontrib>Carlsson, Jan-Otto</creatorcontrib><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Johansson, Ann-Sofie</au><au>Lu, Jun</au><au>Carlsson, Jan-Otto</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>TEM investigation of CVD graphite on nickel</atitle><jtitle>Thin solid films</jtitle><date>1994-11-15</date><risdate>1994</risdate><volume>252</volume><issue>1</issue><spage>19</spage><epage>25</epage><pages>19-25</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><abstract>Graphite films have been deposited by chemical vapour deposition from C 2H 4 at 1170 K on polycrystalline Ni substrates. The graphite films were characterized with respect to surface morphology and microstructure. The interface between the deposited graphite and the Ni grains was investigated by transmission electron microscopy. A smooth interface between the graphite and the Ni was observed. Electron diffraction was used to determine orientation relationships between the graphite and the Ni grains. Four different Ni grain orientations were found and for all four the graphite layers grow parallel to the Ni grain surface. A nucleation and growth mechanism involving hydrogen abstraction reactions and formation of polycyclic hydrocarbons has been proposed.</abstract><pub>Elsevier B.V</pub><doi>10.1016/0040-6090(94)90819-2</doi><tpages>7</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0040-6090
ispartof Thin solid films, 1994-11, Vol.252 (1), p.19-25
issn 0040-6090
1879-2731
language eng
recordid cdi_proquest_miscellaneous_27293157
source Elsevier ScienceDirect Journals
subjects Chemical vapour deposition
Graphite
Nickel
Transmission electron microscopy
title TEM investigation of CVD graphite on nickel
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-03T18%3A13%3A25IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=TEM%20investigation%20of%20CVD%20graphite%20on%20nickel&rft.jtitle=Thin%20solid%20films&rft.au=Johansson,%20Ann-Sofie&rft.date=1994-11-15&rft.volume=252&rft.issue=1&rft.spage=19&rft.epage=25&rft.pages=19-25&rft.issn=0040-6090&rft.eissn=1879-2731&rft_id=info:doi/10.1016/0040-6090(94)90819-2&rft_dat=%3Cproquest_cross%3E27293157%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=27293157&rft_id=info:pmid/&rft_els_id=0040609094908192&rfr_iscdi=true