The formation of metallic silicides of titanium, yttrium, iron, molybdenum and tungsten using metal vapour vacuum arc implantation

The formation of metallic silicides was studied using implantation into Si with ions of Ti, Y, Fe, Mo and W produced by a metal vapour vacuum arc ion source. The electrical properties were measured by four-probe and spread-resistance probe devices. The resistivities are from tens to hundreds of micr...

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Veröffentlicht in:	Surface & coatings technology 1994-08, Vol.66 (1-3), p.355-360
Hauptverfasser:	Tonghe, Z, Jun, C, Guiru, S, Yuguang, W, Yan, L, Xiaoji, D, Yaojun, L, Huixing, Z
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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