CHARACTERISTICS OF (Ba, Sr)TiO3 CAPACITORS WITH TEXTURED Ru BOTTOM ELECTRODE

Ru films were fabricated by dc magnetron sputtering in an Ar/O2 mixture ambient in order to examine the Ru films as electrodes of Ba0.5Sr0.5TiO3 (BST) thin film capacitors. The 100-nm-thick Ru film deposited on Si at 450 C at an O2/(Ar+O2) flow ratio of 40% at 0.5 kW was textured along c-axis. The F...

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Veröffentlicht in:	Jpn.J.Appl.Phys ,Part 1. Vol. 39, no. 11, pp. 6348-6357. 2000 Part 1. Vol. 39, no. 11, pp. 6348-6357. 2000, 2000, Vol.39 (11), p.6348-6357
Hauptverfasser:	Aoyama, T, Yamazaki, S, Imai, K
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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