Chlorine and nitrogen doped carbon grown from a tetrachloroethylene and nitrogen feedstock
Chlorine and nitrogen doped carbon has been grown by chemical vapor deposition of tetrachloroethylene and nitrogen. The film is predominantly carbon (90 at.%) in an amorphous state, but does contain some chlorine terminated carbon nitride aromatic rings, as determined by 13C NMR. The small amount of...
Gespeichert in:
Veröffentlicht in: | Solid state communications 2000-01, Vol.114 (4), p.193-196 |
---|---|
Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 196 |
---|---|
container_issue | 4 |
container_start_page | 193 |
container_title | Solid state communications |
container_volume | 114 |
creator | Lin, S.-H Braddock-Wilking, J Feldman, B.J |
description | Chlorine and nitrogen doped carbon has been grown by chemical vapor deposition of tetrachloroethylene and nitrogen. The film is predominantly carbon (90
at.%) in an amorphous state, but does contain some chlorine terminated carbon nitride aromatic rings, as determined by
13C NMR. The small amount of chlorine present in the material is inadequate to terminate most of the dangling bonds, leading to a large absorption below the optical band gap, but large enough to significantly increase the optical band gap. And the infrared absorption is dominated by an intense line at 1270
cm
−1, which is interpreted as due to the amorphous carbon network. |
doi_str_mv | 10.1016/S0038-1098(00)00043-0 |
format | Article |
fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_27223834</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0038109800000430</els_id><sourcerecordid>27223834</sourcerecordid><originalsourceid>FETCH-LOGICAL-c367t-feba783f16407b9292149968535cdac0583232408aa65d69dbcb3a6c6ed1bb433</originalsourceid><addsrcrecordid>eNqFkE1LxDAQQIMouH78BKEHET1UJ0mbJieRxS8QPKgXLyFNphrtJmtSFf-9XVcUvHiay3szzCNkh8IhBSqObgC4LCkouQ9wAAAVL2GFTKhsVMkaIVbJ5AdZJxs5P41QIxs6IffTxz4mH7AwwRXBDyk-YChcnKMrrEltDMVDiu-h6FKcFaYYcEjGLqSIw-NHj3_VDtHlIdrnLbLWmT7j9vfcJHdnp7fTi_Lq-vxyenJVWi6aoeywNY3kHRUVNK1iitFKKSFrXltnLNSSM84qkMaI2gnlWttyI6xAR9u24nyT7C33zlN8ecU86JnPFvveBIyvWbOGMS55NYL1ErQp5pyw0_PkZyZ9aAp6UVJ_ldSLTBpAf5XUMHq73wdMtqbvkgnW51-ZKQWSjdjxEsPx2TePSWfrMVh0PqEdtIv-n0OffVSIUg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>27223834</pqid></control><display><type>article</type><title>Chlorine and nitrogen doped carbon grown from a tetrachloroethylene and nitrogen feedstock</title><source>ScienceDirect Journals (5 years ago - present)</source><creator>Lin, S.-H ; Braddock-Wilking, J ; Feldman, B.J</creator><creatorcontrib>Lin, S.-H ; Braddock-Wilking, J ; Feldman, B.J</creatorcontrib><description>Chlorine and nitrogen doped carbon has been grown by chemical vapor deposition of tetrachloroethylene and nitrogen. The film is predominantly carbon (90
at.%) in an amorphous state, but does contain some chlorine terminated carbon nitride aromatic rings, as determined by
13C NMR. The small amount of chlorine present in the material is inadequate to terminate most of the dangling bonds, leading to a large absorption below the optical band gap, but large enough to significantly increase the optical band gap. And the infrared absorption is dominated by an intense line at 1270
cm
−1, which is interpreted as due to the amorphous carbon network.</description><identifier>ISSN: 0038-1098</identifier><identifier>EISSN: 1879-2766</identifier><identifier>DOI: 10.1016/S0038-1098(00)00043-0</identifier><identifier>CODEN: SSCOA4</identifier><language>eng</language><publisher>Oxford: Elsevier Ltd</publisher><subject>A. Disordered systems ; A. Nanostructures ; B. Chemical synthesis. D. Optical properties ; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; E. Nuclear resonances ; Exact sciences and technology ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Physics ; Structure and morphology; thickness ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Thin film structure and morphology</subject><ispartof>Solid state communications, 2000-01, Vol.114 (4), p.193-196</ispartof><rights>2000 Elsevier Science Ltd</rights><rights>2000 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c367t-feba783f16407b9292149968535cdac0583232408aa65d69dbcb3a6c6ed1bb433</citedby><cites>FETCH-LOGICAL-c367t-feba783f16407b9292149968535cdac0583232408aa65d69dbcb3a6c6ed1bb433</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/S0038-1098(00)00043-0$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3548,27922,27923,45993</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=1299082$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Lin, S.-H</creatorcontrib><creatorcontrib>Braddock-Wilking, J</creatorcontrib><creatorcontrib>Feldman, B.J</creatorcontrib><title>Chlorine and nitrogen doped carbon grown from a tetrachloroethylene and nitrogen feedstock</title><title>Solid state communications</title><description>Chlorine and nitrogen doped carbon has been grown by chemical vapor deposition of tetrachloroethylene and nitrogen. The film is predominantly carbon (90
at.%) in an amorphous state, but does contain some chlorine terminated carbon nitride aromatic rings, as determined by
13C NMR. The small amount of chlorine present in the material is inadequate to terminate most of the dangling bonds, leading to a large absorption below the optical band gap, but large enough to significantly increase the optical band gap. And the infrared absorption is dominated by an intense line at 1270
cm
−1, which is interpreted as due to the amorphous carbon network.</description><subject>A. Disordered systems</subject><subject>A. Nanostructures</subject><subject>B. Chemical synthesis. D. Optical properties</subject><subject>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>E. Nuclear resonances</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Physics</subject><subject>Structure and morphology; thickness</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Thin film structure and morphology</subject><issn>0038-1098</issn><issn>1879-2766</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><recordid>eNqFkE1LxDAQQIMouH78BKEHET1UJ0mbJieRxS8QPKgXLyFNphrtJmtSFf-9XVcUvHiay3szzCNkh8IhBSqObgC4LCkouQ9wAAAVL2GFTKhsVMkaIVbJ5AdZJxs5P41QIxs6IffTxz4mH7AwwRXBDyk-YChcnKMrrEltDMVDiu-h6FKcFaYYcEjGLqSIw-NHj3_VDtHlIdrnLbLWmT7j9vfcJHdnp7fTi_Lq-vxyenJVWi6aoeywNY3kHRUVNK1iitFKKSFrXltnLNSSM84qkMaI2gnlWttyI6xAR9u24nyT7C33zlN8ecU86JnPFvveBIyvWbOGMS55NYL1ErQp5pyw0_PkZyZ9aAp6UVJ_ldSLTBpAf5XUMHq73wdMtqbvkgnW51-ZKQWSjdjxEsPx2TePSWfrMVh0PqEdtIv-n0OffVSIUg</recordid><startdate>20000101</startdate><enddate>20000101</enddate><creator>Lin, S.-H</creator><creator>Braddock-Wilking, J</creator><creator>Feldman, B.J</creator><general>Elsevier Ltd</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20000101</creationdate><title>Chlorine and nitrogen doped carbon grown from a tetrachloroethylene and nitrogen feedstock</title><author>Lin, S.-H ; Braddock-Wilking, J ; Feldman, B.J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c367t-feba783f16407b9292149968535cdac0583232408aa65d69dbcb3a6c6ed1bb433</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2000</creationdate><topic>A. Disordered systems</topic><topic>A. Nanostructures</topic><topic>B. Chemical synthesis. D. Optical properties</topic><topic>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>E. Nuclear resonances</topic><topic>Exact sciences and technology</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Physics</topic><topic>Structure and morphology; thickness</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Thin film structure and morphology</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lin, S.-H</creatorcontrib><creatorcontrib>Braddock-Wilking, J</creatorcontrib><creatorcontrib>Feldman, B.J</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Solid state communications</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lin, S.-H</au><au>Braddock-Wilking, J</au><au>Feldman, B.J</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Chlorine and nitrogen doped carbon grown from a tetrachloroethylene and nitrogen feedstock</atitle><jtitle>Solid state communications</jtitle><date>2000-01-01</date><risdate>2000</risdate><volume>114</volume><issue>4</issue><spage>193</spage><epage>196</epage><pages>193-196</pages><issn>0038-1098</issn><eissn>1879-2766</eissn><coden>SSCOA4</coden><abstract>Chlorine and nitrogen doped carbon has been grown by chemical vapor deposition of tetrachloroethylene and nitrogen. The film is predominantly carbon (90
at.%) in an amorphous state, but does contain some chlorine terminated carbon nitride aromatic rings, as determined by
13C NMR. The small amount of chlorine present in the material is inadequate to terminate most of the dangling bonds, leading to a large absorption below the optical band gap, but large enough to significantly increase the optical band gap. And the infrared absorption is dominated by an intense line at 1270
cm
−1, which is interpreted as due to the amorphous carbon network.</abstract><cop>Oxford</cop><pub>Elsevier Ltd</pub><doi>10.1016/S0038-1098(00)00043-0</doi><tpages>4</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0038-1098 |
ispartof | Solid state communications, 2000-01, Vol.114 (4), p.193-196 |
issn | 0038-1098 1879-2766 |
language | eng |
recordid | cdi_proquest_miscellaneous_27223834 |
source | ScienceDirect Journals (5 years ago - present) |
subjects | A. Disordered systems A. Nanostructures B. Chemical synthesis. D. Optical properties Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology E. Nuclear resonances Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology |
title | Chlorine and nitrogen doped carbon grown from a tetrachloroethylene and nitrogen feedstock |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-14T06%3A55%3A14IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Chlorine%20and%20nitrogen%20doped%20carbon%20grown%20from%20a%20tetrachloroethylene%20and%20nitrogen%20feedstock&rft.jtitle=Solid%20state%20communications&rft.au=Lin,%20S.-H&rft.date=2000-01-01&rft.volume=114&rft.issue=4&rft.spage=193&rft.epage=196&rft.pages=193-196&rft.issn=0038-1098&rft.eissn=1879-2766&rft.coden=SSCOA4&rft_id=info:doi/10.1016/S0038-1098(00)00043-0&rft_dat=%3Cproquest_cross%3E27223834%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=27223834&rft_id=info:pmid/&rft_els_id=S0038109800000430&rfr_iscdi=true |