Chemical deterioration of Al film prepared on CF4 plasma-etched LiNbO3 surface

The fabrication process of an Al thin-film optical polarizer on LiNbO3 waveguides after CF4 plasma dry etching of a previously deposited SiO2 buffer layer was investigated. The problem in this process is a precipitation of compounds containing C, O, F, and Li on the etched LiNbO3 surface and a chemi...

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Veröffentlicht in:	Journal of materials research 2000-02, Vol.15 (2), p.476-482
Hauptverfasser:	Nagata, Hirotoshi, Miyama, Yasuyuki, Mitsugi, Naoki, Shima, Kaori
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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